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Title: Simulation and optical spectroscopy of a DC discharge in a CH{sub 4}/H{sub 2}/N{sub 2} mixture during deposition of nanostructured carbon films

Abstract

Two-dimensional numerical simulations of a dc discharge in a CH{sub 4}/H{sub 2}/N{sub 2} mixture in the regime of deposition of nanostructured carbon films are carried out with account of the cathode electron beam effects. The distributions of the gas temperature and species number densities are calculated, and the main plasmachemical kinetic processes governing the distribution of methyl radicals above the substrate are analyzed. It is shown that the number density of methyl radicals above the substrate is several orders of magnitude higher than the number densities of other hydrocarbon radicals, which indicates that the former play a dominant role in the growth of nanostructured carbon films. The model is verified by comparing the measured optical emission profiles of the H(n ≡ 3), C{sub 2}{sup *}, CH*, and CN* species and the calculated number densities of excited species, as well as the measured and calculated values of the discharge voltage and heat fluxes onto the electrodes and reactor walls. The key role of ion–electron recombination and dissociative excitation of H{sub 2}, C{sub 2}H{sub 2}, CH{sub 4}, and HCN molecules in the generation of emitting species (first of all, in the cold regions adjacent to the electrodes) is revealed.

Authors:
; ;  [1];  [2];  [1]
  1. Moscow State University, Skobeltsyn Institute of Nuclear Physics (Russian Federation)
  2. Moscow State University (Russian Federation)
Publication Date:
OSTI Identifier:
22760288
Resource Type:
Journal Article
Journal Name:
Plasma Physics Reports
Additional Journal Information:
Journal Volume: 43; Journal Issue: 8; Other Information: Copyright (c) 2017 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1063-780X
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CARBON; COMPUTERIZED SIMULATION; FILMS; HYDROCYANIC ACID; METHANE; METHYL RADICALS; NANOSTRUCTURES; TWO-DIMENSIONAL CALCULATIONS

Citation Formats

Mironovich, K. V., E-mail: mironbasket@mail.ru, Mankelevich, Yu. A., E-mail: ymankelevich@mics.msu.su, Voloshin, D. G., Dagesyan, S. A., and Krivchenko, V. A. Simulation and optical spectroscopy of a DC discharge in a CH{sub 4}/H{sub 2}/N{sub 2} mixture during deposition of nanostructured carbon films. United States: N. p., 2017. Web. doi:10.1134/S1063780X17080098.
Mironovich, K. V., E-mail: mironbasket@mail.ru, Mankelevich, Yu. A., E-mail: ymankelevich@mics.msu.su, Voloshin, D. G., Dagesyan, S. A., & Krivchenko, V. A. Simulation and optical spectroscopy of a DC discharge in a CH{sub 4}/H{sub 2}/N{sub 2} mixture during deposition of nanostructured carbon films. United States. doi:10.1134/S1063780X17080098.
Mironovich, K. V., E-mail: mironbasket@mail.ru, Mankelevich, Yu. A., E-mail: ymankelevich@mics.msu.su, Voloshin, D. G., Dagesyan, S. A., and Krivchenko, V. A. Tue . "Simulation and optical spectroscopy of a DC discharge in a CH{sub 4}/H{sub 2}/N{sub 2} mixture during deposition of nanostructured carbon films". United States. doi:10.1134/S1063780X17080098.
@article{osti_22760288,
title = {Simulation and optical spectroscopy of a DC discharge in a CH{sub 4}/H{sub 2}/N{sub 2} mixture during deposition of nanostructured carbon films},
author = {Mironovich, K. V., E-mail: mironbasket@mail.ru and Mankelevich, Yu. A., E-mail: ymankelevich@mics.msu.su and Voloshin, D. G. and Dagesyan, S. A. and Krivchenko, V. A.},
abstractNote = {Two-dimensional numerical simulations of a dc discharge in a CH{sub 4}/H{sub 2}/N{sub 2} mixture in the regime of deposition of nanostructured carbon films are carried out with account of the cathode electron beam effects. The distributions of the gas temperature and species number densities are calculated, and the main plasmachemical kinetic processes governing the distribution of methyl radicals above the substrate are analyzed. It is shown that the number density of methyl radicals above the substrate is several orders of magnitude higher than the number densities of other hydrocarbon radicals, which indicates that the former play a dominant role in the growth of nanostructured carbon films. The model is verified by comparing the measured optical emission profiles of the H(n ≡ 3), C{sub 2}{sup *}, CH*, and CN* species and the calculated number densities of excited species, as well as the measured and calculated values of the discharge voltage and heat fluxes onto the electrodes and reactor walls. The key role of ion–electron recombination and dissociative excitation of H{sub 2}, C{sub 2}H{sub 2}, CH{sub 4}, and HCN molecules in the generation of emitting species (first of all, in the cold regions adjacent to the electrodes) is revealed.},
doi = {10.1134/S1063780X17080098},
journal = {Plasma Physics Reports},
issn = {1063-780X},
number = 8,
volume = 43,
place = {United States},
year = {2017},
month = {8}
}