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Title: Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing

Abstract

An electron emitting probe in saturated floating potential mode has been used to investigate the temporal evolution of plasma potential and the effect of substrate RF biasing on it for pulsed dual frequency (2 MHz/13.56 MHz) inductively coupled plasma (ICP) source. The low frequency power (P{sub 2MHz}) has been pulsed at 1 KHz and a duty ratio of 50%, while high frequency power (P{sub 13.56MHz}) has been used in continuous mode. The substrate has been biased with a separate bias power at (P{sub 12.56MHz}) Argon has been used as a discharge gas. During the ICP power pulsing, three distinct regions in a typical plasma potential profile, have been identified as ‘initial overshoot’, pulse ‘on-phase’ and pulse ‘off-phase’. It has been found out that the RF biasing of the substrate significantly modulates the temporal evolution of the plasma potential. During the initial overshoot, plasma potential decreases with increasing RF biasing of the substrate, however it increases with increasing substrate biasing for pulse ‘on-phase’ and ‘off-phase’. An interesting structure in plasma potential profile has also been observed when the substrate bias is applied and its evolution depends upon the magnitude of bias power. The reason of the evolution of this structure maymore » be the ambipolar diffusion of electron and its dependence on bias power.« less

Authors:
 [1];  [1];  [2]
  1. Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do, 440-746 (Korea, Republic of)
  2. (SAINT), Sungkyunkwan University, Suwon, Gyeonggi-do, 440-746 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22611366
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 6; Journal Issue: 9; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; AMBIPOLAR DIFFUSION; ARGON; ELECTRONS; EVOLUTION; MHZ RANGE; PLASMA POTENTIAL; PULSES; SUBSTRATES; TRANSIENTS

Citation Formats

Mishra, Anurag, Yeom, Geun Young, E-mail: gyyeom@skku.edu, and SKKU Advanced Institute of Nanotechnology. Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing. United States: N. p., 2016. Web. doi:10.1063/1.4961940.
Mishra, Anurag, Yeom, Geun Young, E-mail: gyyeom@skku.edu, & SKKU Advanced Institute of Nanotechnology. Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing. United States. doi:10.1063/1.4961940.
Mishra, Anurag, Yeom, Geun Young, E-mail: gyyeom@skku.edu, and SKKU Advanced Institute of Nanotechnology. Thu . "Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing". United States. doi:10.1063/1.4961940.
@article{osti_22611366,
title = {Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing},
author = {Mishra, Anurag and Yeom, Geun Young, E-mail: gyyeom@skku.edu and SKKU Advanced Institute of Nanotechnology},
abstractNote = {An electron emitting probe in saturated floating potential mode has been used to investigate the temporal evolution of plasma potential and the effect of substrate RF biasing on it for pulsed dual frequency (2 MHz/13.56 MHz) inductively coupled plasma (ICP) source. The low frequency power (P{sub 2MHz}) has been pulsed at 1 KHz and a duty ratio of 50%, while high frequency power (P{sub 13.56MHz}) has been used in continuous mode. The substrate has been biased with a separate bias power at (P{sub 12.56MHz}) Argon has been used as a discharge gas. During the ICP power pulsing, three distinct regions in a typical plasma potential profile, have been identified as ‘initial overshoot’, pulse ‘on-phase’ and pulse ‘off-phase’. It has been found out that the RF biasing of the substrate significantly modulates the temporal evolution of the plasma potential. During the initial overshoot, plasma potential decreases with increasing RF biasing of the substrate, however it increases with increasing substrate biasing for pulse ‘on-phase’ and ‘off-phase’. An interesting structure in plasma potential profile has also been observed when the substrate bias is applied and its evolution depends upon the magnitude of bias power. The reason of the evolution of this structure may be the ambipolar diffusion of electron and its dependence on bias power.},
doi = {10.1063/1.4961940},
journal = {AIP Advances},
number = 9,
volume = 6,
place = {United States},
year = {Thu Sep 15 00:00:00 EDT 2016},
month = {Thu Sep 15 00:00:00 EDT 2016}
}