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Title: Catalyst-free growth of ZnO nanowires on ITO seed/glass by thermal evaporation method: Effects of ITO seed layer thickness

Abstract

A seed/catalyst-free growth of ZnO nanowires (ZnO-NWs) on a glass substrate were successfully fabricated using thermal evaporation technique. These nanowires were grown on ITO seed layers of different thicknesses of 25 and 75 nm, which were deposited on glass substrates by radio frequency (RF) magnetron sputtering. Prior to synthesized ITO nanowires, the sputtered ITO seeds were annealed using the continuous wave (CW) CO2 laser at 450 °C in air for 15 min. The effect of seed layer thickness on the morphological, structural, and optical properties of ZnO-NWs were systematically investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), and UV-Vis spectrophotometer.

Authors:
;  [1];  [2]
  1. School of Physics, Universiti Sains Malaysia, 11800 USM, Penang (Malaysia)
  2. Institute of Nano-Optoelectronics Research and Technology Laboratory (INOR), Universiti Sains Malaysia, 11800 USM, Penang (Malaysia)
Publication Date:
OSTI Identifier:
22608480
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1756; Journal Issue: 1; Conference: ICoFM 2016: 2. international conference on functional materials and metallurgy, Penang (Malaysia), 28 May 2016; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; CARBON DIOXIDE; CATALYSTS; FIELD EMISSION; GLASS; INDIUM OXIDES; LAYERS; MAGNETRONS; NANOWIRES; OPTICAL PROPERTIES; RADIOWAVE RADIATION; SCANNING ELECTRON MICROSCOPY; SPECTROPHOTOMETERS; SPUTTERING; SUBSTRATES; THICKNESS; TIN OXIDES; X RADIATION; X-RAY DIFFRACTION; ZINC OXIDES

Citation Formats

Alsultany, Forat H., E-mail: foratusm@gmail.com, Ahmed, Naser M., and Hassan, Z. Catalyst-free growth of ZnO nanowires on ITO seed/glass by thermal evaporation method: Effects of ITO seed layer thickness. United States: N. p., 2016. Web. doi:10.1063/1.4958785.
Alsultany, Forat H., E-mail: foratusm@gmail.com, Ahmed, Naser M., & Hassan, Z. Catalyst-free growth of ZnO nanowires on ITO seed/glass by thermal evaporation method: Effects of ITO seed layer thickness. United States. doi:10.1063/1.4958785.
Alsultany, Forat H., E-mail: foratusm@gmail.com, Ahmed, Naser M., and Hassan, Z. Tue . "Catalyst-free growth of ZnO nanowires on ITO seed/glass by thermal evaporation method: Effects of ITO seed layer thickness". United States. doi:10.1063/1.4958785.
@article{osti_22608480,
title = {Catalyst-free growth of ZnO nanowires on ITO seed/glass by thermal evaporation method: Effects of ITO seed layer thickness},
author = {Alsultany, Forat H., E-mail: foratusm@gmail.com and Ahmed, Naser M. and Hassan, Z.},
abstractNote = {A seed/catalyst-free growth of ZnO nanowires (ZnO-NWs) on a glass substrate were successfully fabricated using thermal evaporation technique. These nanowires were grown on ITO seed layers of different thicknesses of 25 and 75 nm, which were deposited on glass substrates by radio frequency (RF) magnetron sputtering. Prior to synthesized ITO nanowires, the sputtered ITO seeds were annealed using the continuous wave (CW) CO2 laser at 450 °C in air for 15 min. The effect of seed layer thickness on the morphological, structural, and optical properties of ZnO-NWs were systematically investigated by X-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), and UV-Vis spectrophotometer.},
doi = {10.1063/1.4958785},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1756,
place = {United States},
year = {2016},
month = {7}
}