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Title: On-axis microscopes for the inelastic x-ray scattering beamline at NSLS-II

Abstract

A novel on-axis X-ray microscope with 3 µm resolution, 3x magnification, and a working distance of 600 mm for in-situ sample alignment and X-ray beam visualization for the Inelastic X-ray Scattering (IXS) beamline at NSLS-II is presented. The microscope uses reflective optics, which minimizes dispersion, and allows imaging from Ultraviolet (UV) to Infrared (IR) with specifically chosen objective components (coatings, etc.). Additionally, a portable high resolution X-ray microscope for KB mirror alignment and X-ray beam characterization was developed.

Authors:
; ; ; ;  [1];  [2]
  1. National Synchrotron Light Source II, Brookhaven National Laboratory, Upton, NY 11973 (United States)
  2. Department of Physics and Astronomy, Stony Brook University, NY 11794 (United States)
Publication Date:
OSTI Identifier:
22608363
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1741; Journal Issue: 1; Conference: SRI2015: 12. international conference on synchrotron radiation instrumentation, New York, NY (United States), 6-10 Jul 2015; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; BEAMS; BIOMEDICAL RADIOGRAPHY; DISPERSIONS; INELASTIC SCATTERING; MICROSCOPES; MIRRORS; NSLS; RESOLUTION; ULTRAVIOLET RADIATION; X RADIATION; X-RAY DIFFRACTION

Citation Formats

Gofron, K. J., E-mail: kgofron@bnl.gov, Cai, Y. Q., Coburn, D. S., Antonelli, S., Suvorov, A., and Flores, J. On-axis microscopes for the inelastic x-ray scattering beamline at NSLS-II. United States: N. p., 2016. Web. doi:10.1063/1.4952850.
Gofron, K. J., E-mail: kgofron@bnl.gov, Cai, Y. Q., Coburn, D. S., Antonelli, S., Suvorov, A., & Flores, J. On-axis microscopes for the inelastic x-ray scattering beamline at NSLS-II. United States. doi:10.1063/1.4952850.
Gofron, K. J., E-mail: kgofron@bnl.gov, Cai, Y. Q., Coburn, D. S., Antonelli, S., Suvorov, A., and Flores, J. Wed . "On-axis microscopes for the inelastic x-ray scattering beamline at NSLS-II". United States. doi:10.1063/1.4952850.
@article{osti_22608363,
title = {On-axis microscopes for the inelastic x-ray scattering beamline at NSLS-II},
author = {Gofron, K. J., E-mail: kgofron@bnl.gov and Cai, Y. Q. and Coburn, D. S. and Antonelli, S. and Suvorov, A. and Flores, J.},
abstractNote = {A novel on-axis X-ray microscope with 3 µm resolution, 3x magnification, and a working distance of 600 mm for in-situ sample alignment and X-ray beam visualization for the Inelastic X-ray Scattering (IXS) beamline at NSLS-II is presented. The microscope uses reflective optics, which minimizes dispersion, and allows imaging from Ultraviolet (UV) to Infrared (IR) with specifically chosen objective components (coatings, etc.). Additionally, a portable high resolution X-ray microscope for KB mirror alignment and X-ray beam characterization was developed.},
doi = {10.1063/1.4952850},
journal = {AIP Conference Proceedings},
number = 1,
volume = 1741,
place = {United States},
year = {Wed Jul 27 00:00:00 EDT 2016},
month = {Wed Jul 27 00:00:00 EDT 2016}
}