skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Dynamics of magnetized plasma sheaths around a trench

Abstract

Considering a magnetized plasma sheath, the temporal evolution of the ion properties (the incident ion flux, the ion impact angle, and the incident ion dose) around a rectangular trench is studied numerically. Our results show that the ion flux along the bottom surface greatly reduces in the presence of magnetic field and its uniformity improves, but the magnetic field does not considerably affect the ion flux along the sidewall. In addition, the thickness of the plasma sheath increases by increasing the magnetic field while its conformality to the target surface reduces faster. Moreover, it is shown that any increase in the magnitude (inclination angle) of the magnetic field causes a decrease (an increase) in the angle of incidence of ions on the bottom and sidewall surfaces. Furthermore, in the presence of magnetic field, the ions strike nearly normal to the surface of the bottom while they become less oblique along the sidewall surface. In addition, contrary to the corners of the trench, it is found that the magnetic field greatly affects the incident ion dose at the center of the trench surfaces. Also, it is shown that the incident ion dose along the sidewall is the highest near the centermore » of the sidewall in both magnetized and magnetic-free cases. However, uniformity of the incident ion dose along the sidewall is better than that along the bottom in both magnetized and unmagnetized plasma sheath.« less

Authors:
 [1]
  1. Physics Department, K. N. Toosi University of Technology, 15418-49611 Tehran (Iran, Islamic Republic of)
Publication Date:
OSTI Identifier:
22599951
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 23; Journal Issue: 8; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; DOSES; INCIDENCE ANGLE; INCLINATION; IONS; MAGNETIC FIELDS; NUMERICAL ANALYSIS; PLASMA SHEATH; SURFACES; THICKNESS

Citation Formats

Hatami, M. M., E-mail: m-hatami@kntu.ac.ir. Dynamics of magnetized plasma sheaths around a trench. United States: N. p., 2016. Web. doi:10.1063/1.4960327.
Hatami, M. M., E-mail: m-hatami@kntu.ac.ir. Dynamics of magnetized plasma sheaths around a trench. United States. doi:10.1063/1.4960327.
Hatami, M. M., E-mail: m-hatami@kntu.ac.ir. Mon . "Dynamics of magnetized plasma sheaths around a trench". United States. doi:10.1063/1.4960327.
@article{osti_22599951,
title = {Dynamics of magnetized plasma sheaths around a trench},
author = {Hatami, M. M., E-mail: m-hatami@kntu.ac.ir},
abstractNote = {Considering a magnetized plasma sheath, the temporal evolution of the ion properties (the incident ion flux, the ion impact angle, and the incident ion dose) around a rectangular trench is studied numerically. Our results show that the ion flux along the bottom surface greatly reduces in the presence of magnetic field and its uniformity improves, but the magnetic field does not considerably affect the ion flux along the sidewall. In addition, the thickness of the plasma sheath increases by increasing the magnetic field while its conformality to the target surface reduces faster. Moreover, it is shown that any increase in the magnitude (inclination angle) of the magnetic field causes a decrease (an increase) in the angle of incidence of ions on the bottom and sidewall surfaces. Furthermore, in the presence of magnetic field, the ions strike nearly normal to the surface of the bottom while they become less oblique along the sidewall surface. In addition, contrary to the corners of the trench, it is found that the magnetic field greatly affects the incident ion dose at the center of the trench surfaces. Also, it is shown that the incident ion dose along the sidewall is the highest near the center of the sidewall in both magnetized and magnetic-free cases. However, uniformity of the incident ion dose along the sidewall is better than that along the bottom in both magnetized and unmagnetized plasma sheath.},
doi = {10.1063/1.4960327},
journal = {Physics of Plasmas},
number = 8,
volume = 23,
place = {United States},
year = {Mon Aug 15 00:00:00 EDT 2016},
month = {Mon Aug 15 00:00:00 EDT 2016}
}