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Title: A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device

Abstract

This paper describes 5 kA, 12 ms pulsed power supply for inductive load of Electron Energy Filter (EEF) in large volume plasma device. The power supply is based upon the principle of rapid sourcing of energy from the capacitor bank (2.8 F/200 V) by using a static switch, comprising of ten Insulated Gate Bipolar Transistors (IGBTs). A suitable mechanism is developed to ensure equal sharing of current and uniform power distribution during the operation of these IGBTs. Safe commutation of power to the EEF is ensured by the proper optimization of its components and by the introduction of over voltage protection (>6 kV) using an indigenously designed snubber circuit. Various time sequences relevant to different actions of power supply, viz., pulse width control and repetition rate, are realized through optically isolated computer controlled interface.

Authors:
; ; ; ;  [1]
  1. Institute for Plasma Research, Gandhinagar (India)
Publication Date:
OSTI Identifier:
22597903
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 87; Journal Issue: 7; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CAPACITORS; ELECTRIC POTENTIAL; ELECTRONS; OPTIMIZATION; PLASMA; POWER DISTRIBUTION; PULSES; SWITCHES; TRANSISTORS; WIDTH

Citation Formats

Srivastava, P. K., E-mail: pkumar@ipr.res.in, Singh, S. K., Sanyasi, A. K., Awasthi, L. M., E-mail: kushagra.lalit@gmail.com, and Mattoo, S. K. A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device. United States: N. p., 2016. Web. doi:10.1063/1.4954981.
Srivastava, P. K., E-mail: pkumar@ipr.res.in, Singh, S. K., Sanyasi, A. K., Awasthi, L. M., E-mail: kushagra.lalit@gmail.com, & Mattoo, S. K. A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device. United States. doi:10.1063/1.4954981.
Srivastava, P. K., E-mail: pkumar@ipr.res.in, Singh, S. K., Sanyasi, A. K., Awasthi, L. M., E-mail: kushagra.lalit@gmail.com, and Mattoo, S. K. Fri . "A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device". United States. doi:10.1063/1.4954981.
@article{osti_22597903,
title = {A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device},
author = {Srivastava, P. K., E-mail: pkumar@ipr.res.in and Singh, S. K. and Sanyasi, A. K. and Awasthi, L. M., E-mail: kushagra.lalit@gmail.com and Mattoo, S. K.},
abstractNote = {This paper describes 5 kA, 12 ms pulsed power supply for inductive load of Electron Energy Filter (EEF) in large volume plasma device. The power supply is based upon the principle of rapid sourcing of energy from the capacitor bank (2.8 F/200 V) by using a static switch, comprising of ten Insulated Gate Bipolar Transistors (IGBTs). A suitable mechanism is developed to ensure equal sharing of current and uniform power distribution during the operation of these IGBTs. Safe commutation of power to the EEF is ensured by the proper optimization of its components and by the introduction of over voltage protection (>6 kV) using an indigenously designed snubber circuit. Various time sequences relevant to different actions of power supply, viz., pulse width control and repetition rate, are realized through optically isolated computer controlled interface.},
doi = {10.1063/1.4954981},
journal = {Review of Scientific Instruments},
number = 7,
volume = 87,
place = {United States},
year = {Fri Jul 15 00:00:00 EDT 2016},
month = {Fri Jul 15 00:00:00 EDT 2016}
}