skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device

Abstract

This paper describes 5 kA, 12 ms pulsed power supply for inductive load of Electron Energy Filter (EEF) in large volume plasma device. The power supply is based upon the principle of rapid sourcing of energy from the capacitor bank (2.8 F/200 V) by using a static switch, comprising of ten Insulated Gate Bipolar Transistors (IGBTs). A suitable mechanism is developed to ensure equal sharing of current and uniform power distribution during the operation of these IGBTs. Safe commutation of power to the EEF is ensured by the proper optimization of its components and by the introduction of over voltage protection (>6 kV) using an indigenously designed snubber circuit. Various time sequences relevant to different actions of power supply, viz., pulse width control and repetition rate, are realized through optically isolated computer controlled interface.

Authors:
; ; ; ;  [1]
  1. Institute for Plasma Research, Gandhinagar (India)
Publication Date:
OSTI Identifier:
22597903
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 87; Journal Issue: 7; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CAPACITORS; ELECTRIC POTENTIAL; ELECTRONS; OPTIMIZATION; PLASMA; POWER DISTRIBUTION; PULSES; SWITCHES; TRANSISTORS; WIDTH

Citation Formats

Srivastava, P. K., E-mail: pkumar@ipr.res.in, Singh, S. K., Sanyasi, A. K., Awasthi, L. M., E-mail: kushagra.lalit@gmail.com, and Mattoo, S. K.. A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device. United States: N. p., 2016. Web. doi:10.1063/1.4954981.
Srivastava, P. K., E-mail: pkumar@ipr.res.in, Singh, S. K., Sanyasi, A. K., Awasthi, L. M., E-mail: kushagra.lalit@gmail.com, & Mattoo, S. K.. A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device. United States. doi:10.1063/1.4954981.
Srivastava, P. K., E-mail: pkumar@ipr.res.in, Singh, S. K., Sanyasi, A. K., Awasthi, L. M., E-mail: kushagra.lalit@gmail.com, and Mattoo, S. K.. 2016. "A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device". United States. doi:10.1063/1.4954981.
@article{osti_22597903,
title = {A 5 kA pulsed power supply for inductive and plasma loads in large volume plasma device},
author = {Srivastava, P. K., E-mail: pkumar@ipr.res.in and Singh, S. K. and Sanyasi, A. K. and Awasthi, L. M., E-mail: kushagra.lalit@gmail.com and Mattoo, S. K.},
abstractNote = {This paper describes 5 kA, 12 ms pulsed power supply for inductive load of Electron Energy Filter (EEF) in large volume plasma device. The power supply is based upon the principle of rapid sourcing of energy from the capacitor bank (2.8 F/200 V) by using a static switch, comprising of ten Insulated Gate Bipolar Transistors (IGBTs). A suitable mechanism is developed to ensure equal sharing of current and uniform power distribution during the operation of these IGBTs. Safe commutation of power to the EEF is ensured by the proper optimization of its components and by the introduction of over voltage protection (>6 kV) using an indigenously designed snubber circuit. Various time sequences relevant to different actions of power supply, viz., pulse width control and repetition rate, are realized through optically isolated computer controlled interface.},
doi = {10.1063/1.4954981},
journal = {Review of Scientific Instruments},
number = 7,
volume = 87,
place = {United States},
year = 2016,
month = 7
}
  • The use of inductive pulse shaping in the power supply for a periodically pulsed carbon dioxide laser is described.
  • The principle of the superconducting inductive energy storage and of superconducting pulse switching is reviewed. Design criteria are discussed by introducing two different laboratory set-ups. Special emphasis will be laid on the methods of charging the energy storage and on the pulse switching. The layout and dimensioning of an experimental pulsed power supply with an energy capacity of 4 MJ are described. First experimental results are presented and future development steps are discussed.
  • This paper describes a system for forming quasitriangular current pulses in an inductive load. It is used in the pulsed excitation of the magnet of an 18-MeV betatron. An auxilliary winding in the magnet provides galvanic decoupling of the circuits and allows the size and weight of the energy commutation and input devices to be decreased.
  • The problem of matching an inductive power supply to a vacuum diode is discussed in application to pulsed charged-particle acceleration. (AIP)
  • An innovative high-power constant-current (CC) pulsed-arc (PA) power-supply (PS) indispensable for a high-density PA plasma ion-source using a lanthanum hexaboride (LaB{sub 6}) filament was devised by combining a constant-voltage (CV) PA-PS, which is composed of an insulated gate bipolar transistor (IGBT) switch, a CV direct-current (dc) PS and a 270 mF capacitor with a CC-PA-PS, which is composed of an IGBT-switch, a CC-dc-PS and a 400 {mu}H inductor, through the inductor. The hybrid-CC-PA-PS succeeded in producing a flat arc-pulse with a peak power of 56 kW (400 Ax140 V) and a duty factor of more than 1.5%(600 {mu}sx25 Hz) formore » Japan Proton Accelerator Research Complex (J-PARC) H{sup -} ion-source stably. It also succeeded in shortening the 99% rising-time of the arc-pulse-current to about 20 {mu}s and tilting up or down the arc-pulse-current arbitrarily and almost linearly by changing the setting voltage of its CV-dc-PS.« less