skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Influence of the voltage waveform during nanocomposite layer deposition by aerosol-assisted atmospheric pressure Townsend discharge

Abstract

This work examines the growth dynamics of TiO{sub 2}-SiO{sub 2} nanocomposite coatings in plane-to-plane Dielectric Barrier Discharges (DBDs) at atmospheric pressure operated in a Townsend regime using nebulized TiO{sub 2} colloidal suspension in hexamethyldisiloxane as the growth precursors. For low-frequency (LF) sinusoidal voltages applied to the DBD cell, with voltage amplitudes lower than the one required for discharge breakdown, Scanning Electron Microscopy of silicon substrates placed on the bottom DBD electrode reveals significant deposition of TiO{sub 2} nanoparticles (NPs) close to the discharge entrance. On the other hand, at higher frequencies (HF), the number of TiO{sub 2} NPs deposited strongly decreases due to their “trapping” in the oscillating voltage and their transport along the gas flow lines. Based on these findings, a combined LF-HF voltage waveform is proposed and used to achieve significant and spatially uniform deposition of TiO{sub 2} NPs across the whole substrate surface. For higher voltage amplitudes, in the presence of hexamethyldisiloxane and nitrous oxide for plasma-enhanced chemical vapor deposition of inorganic layers, it is found that TiO{sub 2} NPs become fully embedded into a silica-like matrix. Similar Raman spectra are obtained for as-prepared TiO{sub 2} NPs and for nanocomposite TiO{sub 2}-SiO{sub 2} coating, suggesting that plasmamore » exposure does not significantly alter the crystalline structure of the TiO{sub 2} NPs injected into the discharge.« less

Authors:
 [1];  [2]; ;  [3]; ;  [1];  [4]
  1. LAPLACE, Université de Toulouse, CNRS, INPT, UPS, Toulouse (France)
  2. (Canada)
  3. Département de Physique, Université de Montréal, Montréal, Québec H3C 3J7 (Canada)
  4. Sorbonne Universités, UPMC Univ. Paris 06, CNRS, Collège de France, Laboratoire de Chimie de la Matière Condensée de Paris (CMCP), 4 place Jussieu, F-75005 Paris (France)
Publication Date:
OSTI Identifier:
22597733
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 120; Journal Issue: 5; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; AEROSOLS; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; GAS FLOW; LAYERS; NANOCOMPOSITES; NANOPARTICLES; NITROUS OXIDE; ORGANIC SILICON COMPOUNDS; PLASMA; RAMAN SPECTRA; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON; SILICON OXIDES; TITANIUM OXIDES; TOWNSEND DISCHARGE; WAVE FORMS

Citation Formats

Profili, J., Département de Physique, Université de Montréal, Montréal, Québec H3C 3J7, Levasseur, O., Stafford, L., Naudé, N., Gherardi, N., E-mail: nicolas.gherardi@laplace.univ-tlse.fr, and Chaneac, C. Influence of the voltage waveform during nanocomposite layer deposition by aerosol-assisted atmospheric pressure Townsend discharge. United States: N. p., 2016. Web. doi:10.1063/1.4959994.
Profili, J., Département de Physique, Université de Montréal, Montréal, Québec H3C 3J7, Levasseur, O., Stafford, L., Naudé, N., Gherardi, N., E-mail: nicolas.gherardi@laplace.univ-tlse.fr, & Chaneac, C. Influence of the voltage waveform during nanocomposite layer deposition by aerosol-assisted atmospheric pressure Townsend discharge. United States. doi:10.1063/1.4959994.
Profili, J., Département de Physique, Université de Montréal, Montréal, Québec H3C 3J7, Levasseur, O., Stafford, L., Naudé, N., Gherardi, N., E-mail: nicolas.gherardi@laplace.univ-tlse.fr, and Chaneac, C. Sun . "Influence of the voltage waveform during nanocomposite layer deposition by aerosol-assisted atmospheric pressure Townsend discharge". United States. doi:10.1063/1.4959994.
@article{osti_22597733,
title = {Influence of the voltage waveform during nanocomposite layer deposition by aerosol-assisted atmospheric pressure Townsend discharge},
author = {Profili, J. and Département de Physique, Université de Montréal, Montréal, Québec H3C 3J7 and Levasseur, O. and Stafford, L. and Naudé, N. and Gherardi, N., E-mail: nicolas.gherardi@laplace.univ-tlse.fr and Chaneac, C.},
abstractNote = {This work examines the growth dynamics of TiO{sub 2}-SiO{sub 2} nanocomposite coatings in plane-to-plane Dielectric Barrier Discharges (DBDs) at atmospheric pressure operated in a Townsend regime using nebulized TiO{sub 2} colloidal suspension in hexamethyldisiloxane as the growth precursors. For low-frequency (LF) sinusoidal voltages applied to the DBD cell, with voltage amplitudes lower than the one required for discharge breakdown, Scanning Electron Microscopy of silicon substrates placed on the bottom DBD electrode reveals significant deposition of TiO{sub 2} nanoparticles (NPs) close to the discharge entrance. On the other hand, at higher frequencies (HF), the number of TiO{sub 2} NPs deposited strongly decreases due to their “trapping” in the oscillating voltage and their transport along the gas flow lines. Based on these findings, a combined LF-HF voltage waveform is proposed and used to achieve significant and spatially uniform deposition of TiO{sub 2} NPs across the whole substrate surface. For higher voltage amplitudes, in the presence of hexamethyldisiloxane and nitrous oxide for plasma-enhanced chemical vapor deposition of inorganic layers, it is found that TiO{sub 2} NPs become fully embedded into a silica-like matrix. Similar Raman spectra are obtained for as-prepared TiO{sub 2} NPs and for nanocomposite TiO{sub 2}-SiO{sub 2} coating, suggesting that plasma exposure does not significantly alter the crystalline structure of the TiO{sub 2} NPs injected into the discharge.},
doi = {10.1063/1.4959994},
journal = {Journal of Applied Physics},
number = 5,
volume = 120,
place = {United States},
year = {Sun Aug 07 00:00:00 EDT 2016},
month = {Sun Aug 07 00:00:00 EDT 2016}
}
  • Cited by 3
  • Dielectric barrier discharge in helium at atmospheric pressure was studied by taking fast images of the discharge during one current pulse using an intensified charge couple device. It was observed that there appears a weakly luminous layer close to the anode at the very beginning of the discharge, then the luminous area gradually expands into the entire gap as the anode layer moves toward the cathode, and finally a highly luminous layer forms close to the cathode at the time around the maximum of the current pulse. The evolution of the discharge pattern indicates a transition from Townsend discharge tomore » glow discharge.« less
  • We present here an analysis of the discharge characteristics of a He plasma jet operating under three different types of applied voltage waveform: (a) a μs-pulse voltage waveform with a slow voltage rise time, (b) ns-pulse, and (c) rectangular voltage waveforms with fast voltage rise time. Optical emission measurements show that the application of a voltage with a fast voltage rise time induces rapid discharge growth and, consequently, produces an abundance of energetic electrons, which in turn leads to high optical emission from the O atoms. We also estimate the optical emission efficiency of the O atom (η{sub o}), whichmore » corresponds roughly to the production efficiency of the reactive O species. η{sub o} increases with increasing applied voltage, and the highest value of η{sub o} is obtained in the shortest pulse discharge, which was ignited by a ns-pulse voltage waveform with a fast voltage rise time and short pulse width.« less
  • The properties of a surface barrier discharge in atmospheric-pressure air at different polarities of applied voltage were studied experimentally. The influence of the voltage polarity on the spatial structure of the discharge and the electric field in the discharge plasma was determined by means of spectroscopic measurements. It is found that the energy deposited in the discharge does not depend on the voltage polarity and that discharges of positive polarity are more homogenous and the electric fields in them are higher.
  • The authors have suggested a process for the simultaneous removal of dusts and gaseous pollutants. Characteristics of the partial discharge in a ferro electric pellet layer have been studied using ac voltages with varying frequency or using square wave voltages. The capacitance of the layer, Ct, consists of the capacitance of each ferroelectric pellet, Cp, and the capacitance of the air gap between each pellet, Cg. Since Cg is much smaller than Cp, the capacitance of the layer is determined mainly by Cg. Therefore the packing of ferroelectric pellets with a large dielectric constant does not increase the value ofmore » Ct significantly, and an excessive increase in the capacitive charging current can be avoided. With an ac voltage application, the partial discharge takes place when the voltage crosses zero, and ceases when the voltage reaches positive or negative peak value. With the increase in frequency of the ac voltage, the period of the partial discharge is widened, and the maximum value of the current pulse, Ip max is increased. At higher frequency, the partial discharge can be generated in a pellet layer with smaller dielectric constant values. When a square wave voltage is applied, a very large current can be obtained during the transient period of the voltage. The value of Ip max should affect the plasma temperature of each pulsive discharge, and should affect the efficiency of the plasma chemical reaction for each discharge. Reaction speed should be proportional to the number of the pulsive discharges for 1 s. The gas cleaning performance of the partial discharge can be adjusted by varying the dielectric constant value, the voltage waveform, and the frequency.« less