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Title: Fabrication of FeSi and Fe{sub 3}Si compounds by electron beam induced mixing of [Fe/Si]{sub 2} and [Fe{sub 3}/Si]{sub 2} multilayers grown by focused electron beam induced deposition

Abstract

Fe-Si binary compounds have been fabricated by focused electron beam induced deposition by the alternating use of iron pentacarbonyl, Fe(CO){sub 5}, and neopentasilane, Si{sub 5}H{sub 12} as precursor gases. The fabrication procedure consisted in preparing multilayer structures which were treated by low-energy electron irradiation and annealing to induce atomic species intermixing. In this way, we are able to fabricate FeSi and Fe{sub 3}Si binary compounds from [Fe/Si]{sub 2} and [Fe{sub 3}/Si]{sub 2} multilayers, as shown by transmission electron microscopy investigations. This fabrication procedure is useful to obtain nanostructured binary alloys from precursors which compete for adsorption sites during growth and, therefore, cannot be used simultaneously.

Authors:
; ;  [1];  [2];  [2]
  1. Physikalisches Institut, Goethe-Universität, Max-von-Laue-Str. 1, D-60438 Frankfurt am Main (Germany)
  2. S3 Center, Nanoscience Institute-CNR, Via Campi 213/a, 41125 Modena (Italy)
Publication Date:
OSTI Identifier:
22596814
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 119; Journal Issue: 23; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ADSORPTION; ANNEALING; BINARY ALLOY SYSTEMS; CARBON MONOXIDE; DEPOSITION; ELECTRON BEAMS; ELECTRONS; FABRICATION; GASES; IRON; IRON SILICIDES; IRRADIATION; LAYERS; MIXING; NANOSTRUCTURES; TRANSMISSION ELECTRON MICROSCOPY

Citation Formats

Porrati, F., Sachser, R., Huth, M., Gazzadi, G. C., Frabboni, S., and FIM Department, University of Modena and Reggio Emilia, Via G. Campi 213/a, 41125 Modena. Fabrication of FeSi and Fe{sub 3}Si compounds by electron beam induced mixing of [Fe/Si]{sub 2} and [Fe{sub 3}/Si]{sub 2} multilayers grown by focused electron beam induced deposition. United States: N. p., 2016. Web. doi:10.1063/1.4954067.
Porrati, F., Sachser, R., Huth, M., Gazzadi, G. C., Frabboni, S., & FIM Department, University of Modena and Reggio Emilia, Via G. Campi 213/a, 41125 Modena. Fabrication of FeSi and Fe{sub 3}Si compounds by electron beam induced mixing of [Fe/Si]{sub 2} and [Fe{sub 3}/Si]{sub 2} multilayers grown by focused electron beam induced deposition. United States. https://doi.org/10.1063/1.4954067
Porrati, F., Sachser, R., Huth, M., Gazzadi, G. C., Frabboni, S., and FIM Department, University of Modena and Reggio Emilia, Via G. Campi 213/a, 41125 Modena. 2016. "Fabrication of FeSi and Fe{sub 3}Si compounds by electron beam induced mixing of [Fe/Si]{sub 2} and [Fe{sub 3}/Si]{sub 2} multilayers grown by focused electron beam induced deposition". United States. https://doi.org/10.1063/1.4954067.
@article{osti_22596814,
title = {Fabrication of FeSi and Fe{sub 3}Si compounds by electron beam induced mixing of [Fe/Si]{sub 2} and [Fe{sub 3}/Si]{sub 2} multilayers grown by focused electron beam induced deposition},
author = {Porrati, F. and Sachser, R. and Huth, M. and Gazzadi, G. C. and Frabboni, S. and FIM Department, University of Modena and Reggio Emilia, Via G. Campi 213/a, 41125 Modena},
abstractNote = {Fe-Si binary compounds have been fabricated by focused electron beam induced deposition by the alternating use of iron pentacarbonyl, Fe(CO){sub 5}, and neopentasilane, Si{sub 5}H{sub 12} as precursor gases. The fabrication procedure consisted in preparing multilayer structures which were treated by low-energy electron irradiation and annealing to induce atomic species intermixing. In this way, we are able to fabricate FeSi and Fe{sub 3}Si binary compounds from [Fe/Si]{sub 2} and [Fe{sub 3}/Si]{sub 2} multilayers, as shown by transmission electron microscopy investigations. This fabrication procedure is useful to obtain nanostructured binary alloys from precursors which compete for adsorption sites during growth and, therefore, cannot be used simultaneously.},
doi = {10.1063/1.4954067},
url = {https://www.osti.gov/biblio/22596814}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 23,
volume = 119,
place = {United States},
year = {Tue Jun 21 00:00:00 EDT 2016},
month = {Tue Jun 21 00:00:00 EDT 2016}
}