Switchable and tunable film bulk acoustic resonator fabricated using barium strontium titanate active layer and Ta{sub 2}O{sub 5}/SiO{sub 2} acoustic reflector
- Structured Materials Industries, Inc., Piscataway, New Jersey 08854 (United States)
- Department of Electrical and Computer Engineering, Colorado State University at Colorado Springs, Colorado Springs, Colorado 80933 (United States)
- Department of Materials Science and Engineering and Institute of Materials Science, University of Connecticut, Storrs, Connecticut 06269 (United States)
A solidly mounted acoustic resonator was fabricated using a Ba{sub 0.60}Sr{sub 0.40}TiO{sub 3} (BST) film deposited by metal organic chemical vapor deposition. The device was acoustically isolated from the substrate using a Bragg reflector consisting of three pairs of Ta{sub 2}O{sub 5}/SiO{sub 2} layers deposited by chemical solution deposition. Transmission electron microscopy verified that the Bragg reflector was not affected by the high temperatures and oxidizing conditions necessary to process high quality BST films. Electrical characterization of the resonator demonstrated a quality factor (Q) of 320 and an electromechanical coupling coefficient (K{sub t}{sup 2}) of 7.0% at 11 V.
- OSTI ID:
- 22594396
- Journal Information:
- Applied Physics Letters, Vol. 109, Issue 5; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ACOUSTICS
BARIUM COMPOUNDS
CHEMICAL VAPOR DEPOSITION
DEPOSITS
FILMS
LAYERS
ORGANOMETALLIC COMPOUNDS
QUALITY FACTOR
RESONATORS
SILICA
SILICON OXIDES
STRONTIUM
STRONTIUM TITANATES
SUBSTRATES
TANTALUM OXIDES
TEMPERATURE RANGE 0400-1000 K
TRANSMISSION ELECTRON MICROSCOPY
SUPERCONDUCTIVITY AND SUPERFLUIDITY
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ACOUSTICS
BARIUM COMPOUNDS
CHEMICAL VAPOR DEPOSITION
DEPOSITS
FILMS
LAYERS
ORGANOMETALLIC COMPOUNDS
QUALITY FACTOR
RESONATORS
SILICA
SILICON OXIDES
STRONTIUM
STRONTIUM TITANATES
SUBSTRATES
TANTALUM OXIDES
TEMPERATURE RANGE 0400-1000 K
TRANSMISSION ELECTRON MICROSCOPY