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Title: Room temperature ferroelectricity in continuous croconic acid thin films

Abstract

Ferroelectricity at room temperature has been demonstrated in nanometer-thin quasi 2D croconic acid thin films, by the polarization hysteresis loop measurements in macroscopic capacitor geometry, along with observation and manipulation of the nanoscale domain structure by piezoresponse force microscopy. The fabrication of continuous thin films of the hydrogen-bonded croconic acid was achieved by the suppression of the thermal decomposition using low evaporation temperatures in high vacuum, combined with growth conditions far from thermal equilibrium. For nominal coverages ≥20 nm, quasi 2D and polycrystalline films, with an average grain size of 50–100 nm and 3.5 nm roughness, can be obtained. Spontaneous ferroelectric domain structures of the thin films have been observed and appear to correlate with the grain patterns. The application of this solvent-free growth protocol may be a key to the development of flexible organic ferroelectric thin films for electronic applications.

Authors:
; ; ; ;  [1];  [1];  [2]; ; ;  [3];  [4]; ; ;  [1];  [5]
  1. Department of Physics and Astronomy, University of Nebraska, Lincoln, Nebraska 68588 (United States)
  2. (China)
  3. Department of Physics, Bryn Mawr College, Bryn Mawr, Pennsylvania 19010 (United States)
  4. Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
  5. (United States)
Publication Date:
OSTI Identifier:
22594295
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 109; Journal Issue: 10; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CAPACITORS; DOMAIN STRUCTURE; EVAPORATION; FABRICATION; FERROELECTRIC MATERIALS; GEOMETRY; GRAIN SIZE; HYDROGEN; MICROSCOPY; NANOSTRUCTURES; POLARIZATION; POLYCRYSTALS; PYROLYSIS; ROUGHNESS; TEMPERATURE RANGE 0273-0400 K; THERMAL EQUILIBRIUM; THIN FILMS; TWO-DIMENSIONAL CALCULATIONS

Citation Formats

Jiang, Xuanyuan, Lu, Haidong, Yin, Yuewei, Ahmadi, Zahra, Costa, Paulo S., Zhang, Xiaozhe, Department of Physics, Xi'an Jiaotong University, Xi'an 710049, Wang, Xiao, Yu, Le, Cheng, Xuemei, DiChiara, Anthony D., Gruverman, Alexei, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, Enders, Axel, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, Xu, Xiaoshan, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, and Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588. Room temperature ferroelectricity in continuous croconic acid thin films. United States: N. p., 2016. Web. doi:10.1063/1.4962278.
Jiang, Xuanyuan, Lu, Haidong, Yin, Yuewei, Ahmadi, Zahra, Costa, Paulo S., Zhang, Xiaozhe, Department of Physics, Xi'an Jiaotong University, Xi'an 710049, Wang, Xiao, Yu, Le, Cheng, Xuemei, DiChiara, Anthony D., Gruverman, Alexei, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, Enders, Axel, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, Xu, Xiaoshan, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, & Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588. Room temperature ferroelectricity in continuous croconic acid thin films. United States. doi:10.1063/1.4962278.
Jiang, Xuanyuan, Lu, Haidong, Yin, Yuewei, Ahmadi, Zahra, Costa, Paulo S., Zhang, Xiaozhe, Department of Physics, Xi'an Jiaotong University, Xi'an 710049, Wang, Xiao, Yu, Le, Cheng, Xuemei, DiChiara, Anthony D., Gruverman, Alexei, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, Enders, Axel, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, Xu, Xiaoshan, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu, and Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588. Mon . "Room temperature ferroelectricity in continuous croconic acid thin films". United States. doi:10.1063/1.4962278.
@article{osti_22594295,
title = {Room temperature ferroelectricity in continuous croconic acid thin films},
author = {Jiang, Xuanyuan and Lu, Haidong and Yin, Yuewei and Ahmadi, Zahra and Costa, Paulo S. and Zhang, Xiaozhe and Department of Physics, Xi'an Jiaotong University, Xi'an 710049 and Wang, Xiao and Yu, Le and Cheng, Xuemei and DiChiara, Anthony D. and Gruverman, Alexei, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu and Enders, Axel, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu and Xu, Xiaoshan, E-mail: alexei-gruverman@unl.edu, E-mail: a.enders@me.com, E-mail: xiaoshan.xu@unl.edu and Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska 68588},
abstractNote = {Ferroelectricity at room temperature has been demonstrated in nanometer-thin quasi 2D croconic acid thin films, by the polarization hysteresis loop measurements in macroscopic capacitor geometry, along with observation and manipulation of the nanoscale domain structure by piezoresponse force microscopy. The fabrication of continuous thin films of the hydrogen-bonded croconic acid was achieved by the suppression of the thermal decomposition using low evaporation temperatures in high vacuum, combined with growth conditions far from thermal equilibrium. For nominal coverages ≥20 nm, quasi 2D and polycrystalline films, with an average grain size of 50–100 nm and 3.5 nm roughness, can be obtained. Spontaneous ferroelectric domain structures of the thin films have been observed and appear to correlate with the grain patterns. The application of this solvent-free growth protocol may be a key to the development of flexible organic ferroelectric thin films for electronic applications.},
doi = {10.1063/1.4962278},
journal = {Applied Physics Letters},
number = 10,
volume = 109,
place = {United States},
year = {Mon Sep 05 00:00:00 EDT 2016},
month = {Mon Sep 05 00:00:00 EDT 2016}
}