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Title: Spatial atomic layer deposition of ZnO/TiO{sub 2} nanolaminates

Abstract

Spatial atomic layer deposition (S-ALD) is a potential high-throughput manufacturing technique offering fast and large scale ultrathin films deposition. Here, an S-ALD system with modular injectors is introduced for fabricating binary oxides and their nanolaminates. By optimizing the deposition conditions, both ZnO and TiO{sub 2} films demonstrate linear growth and desired surface morphology. The as-deposited ZnO film has high carrier mobility, and the TiO{sub 2} film shows suitable optical transmittance and band gap. The ZnO/TiO{sub 2} nanolaminates are fabricated by alternating substrate movement between each S-ALD modular units of ZnO and TiO{sub 2}. The grazing incidence x-ray diffraction spectra of nanolaminates demonstrating the signature peaks are weaker for the same thickness nanolaminates with more bilayers, suggesting tuning nanolaminates from crystalline to amorphous. Optical transmittances of ZnO/TiO{sub 2} laminates are enhanced with the increase of the bilayers' number in the visible range. Refractive indices of nanolaminates increase with the thickness of each bilayer decreasing, which demonstrates the feasibility of obtaining desired refractive indices by controlling the bilayer number. The electronic properties, including mobility, carrier concentration, and conductivity, are also tunable with different bilayers.

Authors:
; ; ; ; ;  [1];  [2]
  1. State Key Laboratory of Digital Manufacturing Equipment and Technology, School of Mechanical Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China)
  2. State Key Laboratory of Material Processing and Die and Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074 (China)
Publication Date:
OSTI Identifier:
22592864
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 34; Journal Issue: 5; Other Information: (c) 2016 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; CARRIER MOBILITY; CARRIERS; CONCENTRATION RATIO; DEPOSITION; GRAZING; LAYERS; MANUFACTURING; MORPHOLOGY; OPTIMIZATION; REFRACTIVE INDEX; SUBSTRATES; SURFACES; THICKNESS; THIN FILMS; TITANIUM OXIDES; TUNING; X-RAY DIFFRACTION; ZINC OXIDES

Citation Formats

Chen, Rong, E-mail: rongchen@mail.hust.edu.cn, Lin, Ji-Long, He, Wen-Jie, Duan, Chen-Long, Peng, Qi, Wang, Xiao-Lei, and Shan, Bin. Spatial atomic layer deposition of ZnO/TiO{sub 2} nanolaminates. United States: N. p., 2016. Web. doi:10.1116/1.4955289.
Chen, Rong, E-mail: rongchen@mail.hust.edu.cn, Lin, Ji-Long, He, Wen-Jie, Duan, Chen-Long, Peng, Qi, Wang, Xiao-Lei, & Shan, Bin. Spatial atomic layer deposition of ZnO/TiO{sub 2} nanolaminates. United States. doi:10.1116/1.4955289.
Chen, Rong, E-mail: rongchen@mail.hust.edu.cn, Lin, Ji-Long, He, Wen-Jie, Duan, Chen-Long, Peng, Qi, Wang, Xiao-Lei, and Shan, Bin. Thu . "Spatial atomic layer deposition of ZnO/TiO{sub 2} nanolaminates". United States. doi:10.1116/1.4955289.
@article{osti_22592864,
title = {Spatial atomic layer deposition of ZnO/TiO{sub 2} nanolaminates},
author = {Chen, Rong, E-mail: rongchen@mail.hust.edu.cn and Lin, Ji-Long and He, Wen-Jie and Duan, Chen-Long and Peng, Qi and Wang, Xiao-Lei and Shan, Bin},
abstractNote = {Spatial atomic layer deposition (S-ALD) is a potential high-throughput manufacturing technique offering fast and large scale ultrathin films deposition. Here, an S-ALD system with modular injectors is introduced for fabricating binary oxides and their nanolaminates. By optimizing the deposition conditions, both ZnO and TiO{sub 2} films demonstrate linear growth and desired surface morphology. The as-deposited ZnO film has high carrier mobility, and the TiO{sub 2} film shows suitable optical transmittance and band gap. The ZnO/TiO{sub 2} nanolaminates are fabricated by alternating substrate movement between each S-ALD modular units of ZnO and TiO{sub 2}. The grazing incidence x-ray diffraction spectra of nanolaminates demonstrating the signature peaks are weaker for the same thickness nanolaminates with more bilayers, suggesting tuning nanolaminates from crystalline to amorphous. Optical transmittances of ZnO/TiO{sub 2} laminates are enhanced with the increase of the bilayers' number in the visible range. Refractive indices of nanolaminates increase with the thickness of each bilayer decreasing, which demonstrates the feasibility of obtaining desired refractive indices by controlling the bilayer number. The electronic properties, including mobility, carrier concentration, and conductivity, are also tunable with different bilayers.},
doi = {10.1116/1.4955289},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 5,
volume = 34,
place = {United States},
year = {Thu Sep 15 00:00:00 EDT 2016},
month = {Thu Sep 15 00:00:00 EDT 2016}
}