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Title: Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge

Abstract

The electron density, n{sub e}, modulation is measured experimentally using a resonance hairpin probe in a pulsed, dual-frequency (2/13.56 MHz), dual-antenna, inductively coupled plasma discharge produced in argon-C{sub 4}F{sub 8} (90–10) gas mixtures. The 2 MHz power is pulsed at a frequency of 1 kHz, whereas 13.56 MHz power is applied in continuous wave mode. The discharge is operated at a range of conditions covering 3–50 mTorr, 100–600 W 13.56 MHz power level, 300–600 W 2 MHz peak power level, and duty ratio of 10%–90%. The experimental results reveal that the quasisteady state n{sub e} is greatly affected by the 2 MHz power levels and slightly affected by 13.56 MHz power levels. It is observed that the electron density increases by a factor of 2–2.5 on increasing 2 MHz power level from 300 to 600 W, whereas n{sub e} increases by only ∼20% for 13.56 MHz power levels of 100–600 W. The rise time and decay time constant of n{sub e} monotonically decrease with an increase in either 2 or 13.56 MHz power level. This effect is stronger at low values of 2 MHz power level. For all the operating conditions, it is observed that the n{sub e} overshoots at the beginning of the on-phase before relaxing to a quasisteady state value. The relative overshoot densitymore » (in percent) depends on 2 and 13.56 MHz power levels. On increasing gas pressure, the n{sub e} at first increases, reaching to a maximum value, and then decreases with a further increase in gas pressure. The decay time constant of n{sub e} increases monotonically with pressure, increasing rapidly up to 10 mTorr gas pressure and at a slower rate of rise to 50 mTorr. At a fixed 2/13.56 MHz power level and 10 mTorr gas pressure, the quasisteady state n{sub e} shows maximum for 30%–40% duty ratio and decreases with a further increase in duty ratio.« less

Authors:
 [1];  [2];  [3];  [4]
  1. Plasma Research Laboratory, School of Physical Sciences, Dublin City University, Dublin 9 (Ireland)
  2. Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)
  3. Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746, South Korea and SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, Gyeunggi-do 440-746 (Korea, Republic of)
  4. Plasma Research Laboratory, School of Physical Sciences, Dublin City University, Dublin 9, Ireland and Department of Advanced Materials Science and Engineering, Sungkyunkwan University, Suwon, Gyeonggi-do 440-746 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22592850
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 34; Journal Issue: 5; Other Information: (c) 2016 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ANTENNAS; ARGON; AUGMENTATION; ELECTRON DENSITY; KHZ RANGE 01-100; MHZ RANGE; MIXTURES; MODULATION; PEAK LOAD; PLASMA; PULSE RISE TIME; PULSES

Citation Formats

Sirse, Nishant, E-mail: nishant.sirse@dcu.ie, Mishra, Anurag, Yeom, Geun Y., and Ellingboe, Albert R. Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge. United States: N. p., 2016. Web. doi:10.1116/1.4959844.
Sirse, Nishant, E-mail: nishant.sirse@dcu.ie, Mishra, Anurag, Yeom, Geun Y., & Ellingboe, Albert R. Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge. United States. doi:10.1116/1.4959844.
Sirse, Nishant, E-mail: nishant.sirse@dcu.ie, Mishra, Anurag, Yeom, Geun Y., and Ellingboe, Albert R. 2016. "Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge". United States. doi:10.1116/1.4959844.
@article{osti_22592850,
title = {Electron density modulation in a pulsed dual-frequency (2/13.56 MHz) dual-antenna inductively coupled plasma discharge},
author = {Sirse, Nishant, E-mail: nishant.sirse@dcu.ie and Mishra, Anurag and Yeom, Geun Y. and Ellingboe, Albert R.},
abstractNote = {The electron density, n{sub e}, modulation is measured experimentally using a resonance hairpin probe in a pulsed, dual-frequency (2/13.56 MHz), dual-antenna, inductively coupled plasma discharge produced in argon-C{sub 4}F{sub 8} (90–10) gas mixtures. The 2 MHz power is pulsed at a frequency of 1 kHz, whereas 13.56 MHz power is applied in continuous wave mode. The discharge is operated at a range of conditions covering 3–50 mTorr, 100–600 W 13.56 MHz power level, 300–600 W 2 MHz peak power level, and duty ratio of 10%–90%. The experimental results reveal that the quasisteady state n{sub e} is greatly affected by the 2 MHz power levels and slightly affected by 13.56 MHz power levels. It is observed that the electron density increases by a factor of 2–2.5 on increasing 2 MHz power level from 300 to 600 W, whereas n{sub e} increases by only ∼20% for 13.56 MHz power levels of 100–600 W. The rise time and decay time constant of n{sub e} monotonically decrease with an increase in either 2 or 13.56 MHz power level. This effect is stronger at low values of 2 MHz power level. For all the operating conditions, it is observed that the n{sub e} overshoots at the beginning of the on-phase before relaxing to a quasisteady state value. The relative overshoot density (in percent) depends on 2 and 13.56 MHz power levels. On increasing gas pressure, the n{sub e} at first increases, reaching to a maximum value, and then decreases with a further increase in gas pressure. The decay time constant of n{sub e} increases monotonically with pressure, increasing rapidly up to 10 mTorr gas pressure and at a slower rate of rise to 50 mTorr. At a fixed 2/13.56 MHz power level and 10 mTorr gas pressure, the quasisteady state n{sub e} shows maximum for 30%–40% duty ratio and decreases with a further increase in duty ratio.},
doi = {10.1116/1.4959844},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 5,
volume = 34,
place = {United States},
year = 2016,
month = 9
}
  • Using a Langmuir probe, time resolved measurements of plasma parameters were carried out in a discharge produced by a pulsed dual frequency inductively coupled plasma source. The discharge was sustained in an argon gas environment at a pressure of 10 mTorr. The low frequency (P{sub 2} {sub MHz}) was pulsed at 1 kHz and a duty ratio of 50%, while high frequency (P{sub 13.56} {sub MHz}) was maintained in the CW mode. All measurements were carried out at the center of the discharge and 20 mm above the substrate. The results show that, at a particular condition (P{sub 2} {sub MHz} = 200more » W and P{sub 13.56} {sub MHz }= 600 W), plasma density increases with time and stabilizes at up to ∼200 μs after the initiation of P{sub 2} {sub MHz} pulse at a plasma density of (2 × 10{sup 17} m{sup −3}) for the remaining duration of pulse “on.” This stabilization time for plasma density increases with increasing P{sub 2} {sub MHz} and becomes ∼300 μs when P{sub 2} {sub MHz} is 600 W; however, the growth rate of plasma density is almost independent of P{sub 2} {sub MHz}. Interestingly, the plasma density sharply increases as the pulse is switched off and reaches a peak value in ∼10 μs, then decreases for the remaining pulse “off-time.” This phenomenon is thought to be due to the sheath modulation during the transition from “pulse on” to “pulse off” and partly due to RF noise during the transition period. The magnitude of peak plasma density in off time increases with increasing P{sub 2} {sub MHz}. The plasma potential and electron temperature decrease as the pulse develops and shows similar behavior to that of the plasma density when the pulse is switched off.« less
  • Controlling time averaged ion energy distribution (IED) is becoming increasingly important in many plasma material processing applications for plasma etching and deposition. The present study reports the evolution of ion energy distributions with radio frequency (RF) powers in a pulsed dual frequency inductively discharge and also investigates the effect of duty ratio. The discharge has been sustained using two radio frequency, low (P{sub 2 MHz} = 2 MHz) and high (P{sub 13.56 MHz} = 13.56 MHz) at a pressure of 10 mTorr in argon (90%) and CF{sub 4} (10%) environment. The low frequency RF powers have been varied from 100 to 600 W, whereas the high frequency powers frommore » 200 to 1200 W. Typically, IEDs show bimodal structure and energy width (energy separation between the high and low energy peaks) increases with increasing P{sub 13.56 MHz}; however, it shows opposite trends with P{sub 2 MHz}. It has been observed that IEDs bimodal structure tends to mono-modal structure and energy peaks shift towards low energy side as duty ratio increases, keeping pulse power owing to mode transition (capacitive to inductive) constant.« less
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