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Title: Atomic force microscopy studies of homoepitaxial GaN layers grown on GaN template by laser MBE

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4945240· OSTI ID:22591114
 [1]; ;  [2];  [3];
  1. CSIR-National Physical Laboratory, Dr K.S. Krishnan Road, New Delhi 110012 (India)
  2. Department of Applied Physics, Delhi Technological University, Delhi 110042 (India)
  3. Rajasthan Technical University, Rawatbhata Road, Kota 324010 (India)

We have grown homoepitaxial GaN films on metal organic chemical vapor deposition (MOCVD) grown 3.5 µm thick GaN on sapphire (0001) substrate (GaN template) using an ultra-high vacuum (UHV) laser assisted molecular beam epitaxy (LMBE) system. The GaN films were grown by laser ablating a polycrystalline solid GaN target in the presence of active r.f. nitrogen plasma. The influence of laser repetition rates (10-30 Hz) on the surface morphology of homoepitaxial GaN layers have been studied using atomic force microscopy. It was found that GaN layer grown at 10 Hz shows a smooth surface with uniform grain size compared to the rough surface with irregular shape grains obtained at 30 Hz. The variation of surface roughness of the homoepitaxial GaN layer with and without wet chemical etching has been also studied and it was observed that the roughness of the film decreased after wet etching due to the curved structure/rough surface.

OSTI ID:
22591114
Journal Information:
AIP Conference Proceedings, Vol. 1724, Issue 1; Conference: ETMN-2015: 2. international conference on emerging technologies: Micro to nano 2015, Rajasthan (India), 24-25 Oct 2015; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English