skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Highly uniform parallel microfabrication using a large numerical aperture system

Abstract

In this letter, we report an improved algorithm to produce accurate phase patterns for generating highly uniform diffraction-limited multifocal arrays in a large numerical aperture objective system. It is shown that based on the original diffraction integral, the uniformity of the diffraction-limited focal arrays can be improved from ∼75% to >97%, owing to the critical consideration of the aperture function and apodization effect associated with a large numerical aperture objective. The experimental results, e.g., 3 × 3 arrays of square and triangle, seven microlens arrays with high uniformity, further verify the advantage of the improved algorithm. This algorithm enables the laser parallel processing technology to realize uniform microstructures and functional devices in the microfabrication system with a large numerical aperture objective.

Authors:
;  [1]; ; ; ; ; ;  [2]
  1. School of Electrical Engineering and Automation, Anhui University, Hefei 230601 (China)
  2. CAS Key Laboratory of Mechanical Behavior and Design of Materials, Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026 (China)
Publication Date:
OSTI Identifier:
22590589
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 109; Journal Issue: 2; Other Information: (c) 2016 Author(s); Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ALGORITHMS; APERTURES; DIFFRACTION; EQUIPMENT; LASERS; MICROSTRUCTURE; PARALLEL PROCESSING

Citation Formats

Zhang, Zi-Yu, Su, Ya-Hui, E-mail: ustcsyh@ahu.edu.cn, E-mail: dongwu@ustc.edu.cn, Zhang, Chen-Chu, Hu, Yan-Lei, Wang, Chao-Wei, Li, Jia-Wen, Chu, Jia-Ru, and Wu, Dong, E-mail: ustcsyh@ahu.edu.cn, E-mail: dongwu@ustc.edu.cn. Highly uniform parallel microfabrication using a large numerical aperture system. United States: N. p., 2016. Web. doi:10.1063/1.4955477.
Zhang, Zi-Yu, Su, Ya-Hui, E-mail: ustcsyh@ahu.edu.cn, E-mail: dongwu@ustc.edu.cn, Zhang, Chen-Chu, Hu, Yan-Lei, Wang, Chao-Wei, Li, Jia-Wen, Chu, Jia-Ru, & Wu, Dong, E-mail: ustcsyh@ahu.edu.cn, E-mail: dongwu@ustc.edu.cn. Highly uniform parallel microfabrication using a large numerical aperture system. United States. doi:10.1063/1.4955477.
Zhang, Zi-Yu, Su, Ya-Hui, E-mail: ustcsyh@ahu.edu.cn, E-mail: dongwu@ustc.edu.cn, Zhang, Chen-Chu, Hu, Yan-Lei, Wang, Chao-Wei, Li, Jia-Wen, Chu, Jia-Ru, and Wu, Dong, E-mail: ustcsyh@ahu.edu.cn, E-mail: dongwu@ustc.edu.cn. Mon . "Highly uniform parallel microfabrication using a large numerical aperture system". United States. doi:10.1063/1.4955477.
@article{osti_22590589,
title = {Highly uniform parallel microfabrication using a large numerical aperture system},
author = {Zhang, Zi-Yu and Su, Ya-Hui, E-mail: ustcsyh@ahu.edu.cn, E-mail: dongwu@ustc.edu.cn and Zhang, Chen-Chu and Hu, Yan-Lei and Wang, Chao-Wei and Li, Jia-Wen and Chu, Jia-Ru and Wu, Dong, E-mail: ustcsyh@ahu.edu.cn, E-mail: dongwu@ustc.edu.cn},
abstractNote = {In this letter, we report an improved algorithm to produce accurate phase patterns for generating highly uniform diffraction-limited multifocal arrays in a large numerical aperture objective system. It is shown that based on the original diffraction integral, the uniformity of the diffraction-limited focal arrays can be improved from ∼75% to >97%, owing to the critical consideration of the aperture function and apodization effect associated with a large numerical aperture objective. The experimental results, e.g., 3 × 3 arrays of square and triangle, seven microlens arrays with high uniformity, further verify the advantage of the improved algorithm. This algorithm enables the laser parallel processing technology to realize uniform microstructures and functional devices in the microfabrication system with a large numerical aperture objective.},
doi = {10.1063/1.4955477},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 2,
volume = 109,
place = {United States},
year = {2016},
month = {7}
}