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Title: Specific features of single-pulse femtosecond laser micron and submicron ablation of a thin silver film coated with a micron-thick photoresist layer

Abstract

Specific features of ablation of a thin silver film with a 1-μm-thick layer of a highly transparent photoresist and the same film without a photoresist layer under single tightly focused femtosecond laser pulses in the visible range (515 nm) are experimentally investigated. Interference effects of internal modification of the photoresist layer, its spallation ablation from the film surface and formation of through hollow submicron channels in the resist without its spallation but with ablation of the silver film lying under the resist are found and discussed. (extreme light fields and their applications)

Authors:
; ; ; ;  [1]; ;  [2]
  1. P N Lebedev Physics Institute, Russian Academy of Sciences, Moscow (Russian Federation)
  2. N.E. Bauman Moscow State Technical University, Moscow (Russian Federation)
Publication Date:
OSTI Identifier:
22551257
Resource Type:
Journal Article
Journal Name:
Quantum Electronics (Woodbury, N.Y.)
Additional Journal Information:
Journal Volume: 45; Journal Issue: 5; Other Information: Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1063-7818
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABLATION; INTERFERENCE; LASER RADIATION; PHOTORESISTORS; SILVER; SPALLATION; SURFACES; THIN FILMS

Citation Formats

Zayarnyi, D A, Ionin, A A, Kudryashov, S I, Makarov, S V, Rudenko, A A, Drozdova, E A, and Odinokov, S B. Specific features of single-pulse femtosecond laser micron and submicron ablation of a thin silver film coated with a micron-thick photoresist layer. United States: N. p., 2015. Web. doi:10.1070/QE2015V045N05ABEH015788.
Zayarnyi, D A, Ionin, A A, Kudryashov, S I, Makarov, S V, Rudenko, A A, Drozdova, E A, & Odinokov, S B. Specific features of single-pulse femtosecond laser micron and submicron ablation of a thin silver film coated with a micron-thick photoresist layer. United States. doi:10.1070/QE2015V045N05ABEH015788.
Zayarnyi, D A, Ionin, A A, Kudryashov, S I, Makarov, S V, Rudenko, A A, Drozdova, E A, and Odinokov, S B. Sun . "Specific features of single-pulse femtosecond laser micron and submicron ablation of a thin silver film coated with a micron-thick photoresist layer". United States. doi:10.1070/QE2015V045N05ABEH015788.
@article{osti_22551257,
title = {Specific features of single-pulse femtosecond laser micron and submicron ablation of a thin silver film coated with a micron-thick photoresist layer},
author = {Zayarnyi, D A and Ionin, A A and Kudryashov, S I and Makarov, S V and Rudenko, A A and Drozdova, E A and Odinokov, S B},
abstractNote = {Specific features of ablation of a thin silver film with a 1-μm-thick layer of a highly transparent photoresist and the same film without a photoresist layer under single tightly focused femtosecond laser pulses in the visible range (515 nm) are experimentally investigated. Interference effects of internal modification of the photoresist layer, its spallation ablation from the film surface and formation of through hollow submicron channels in the resist without its spallation but with ablation of the silver film lying under the resist are found and discussed. (extreme light fields and their applications)},
doi = {10.1070/QE2015V045N05ABEH015788},
journal = {Quantum Electronics (Woodbury, N.Y.)},
issn = {1063-7818},
number = 5,
volume = 45,
place = {United States},
year = {2015},
month = {5}
}