In situ infrared study of catalytic decomposition of NO. Semiannually technical progress report, August 1, 1995--February 1, 1996
During the first semi-annual period of the project, NO adsorption, CO adsorption, NO temperature-programmed desorption and decomposition (TPD), and temperature programmed reaction (TPR) of NO-CO have been studied over 0.5% wt% Rh/SiO{sub 2} catalysts by a combined infrared and mass spectrometric technique. Infrared study reveals that the high wavenumber Rh-NO{sup {delta}{minus}} at 1723-1740 cm{sup {minus}1} is the dominant adsorbate during TPD and TPR with NO:CO=1:1. During TPR, CO reduces part of Rh surface resulting in the formation of the low wavenumber Rh-NO{sup {delta}{minus}} at 1634-1680 cm{sup {minus}1}. Increasing CO partial pressure (i) promotes the formation of Rh to Rh{sup 0} sites, producing linear CO, (ii) increases the selectivity to N{sub 2}O below the light-off temperature, (iii) raises the light-off temperature, and (iv) promotes the formation of Si-NCO and Rh-NCO. Comparison of results of the present study with those of previous studies on 4 wt% Rh/SiO{sub 2} shows that different dispersion of Rh crystallites on SiO{sub 2} support results in significant variation in chemisorptive and reactive properties of Rh metal for NO-CO reaction.
- Research Organization:
- Akron Univ., OH (United States). Dept. of Chemical Engineering
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- FG22-95PC95224
- OSTI ID:
- 225026
- Report Number(s):
- DOE/PC/95224-T1; ON: DE96010219
- Resource Relation:
- Other Information: PBD: 4 Mar 1996
- Country of Publication:
- United States
- Language:
- English
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