Wave-optical assessment of alignment tolerances in nano-focusing with ellipsoidal mirror

doi:https://doi.org/10.1063/1.4937527

Title: Wave-optical assessment of alignment tolerances in nano-focusing with ellipsoidal mirror

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Abstract

High-precision ellipsoidal mirrors, which can efficiently focus X-rays to the nanometer dimension with a mirror, have not been realized because of the difficulties in the fabrication process. The purpose of our study was to develop nano-focusing ellipsoidal mirrors in the hard X-ray region. We developed a wave-optical focusing simulator for investigating alignment tolerances in nano-focusing with a designed ellipsoidal mirror, which produce a diffraction-limited focus size of 30 × 35 nm{sup 2} in full width at half maximum at an X-ray energy of 7 keV. The simulator can calculate focusing intensity distributions around the focal point under conditions of misalignment. The wave-optical simulator enabled the calculation of interference intensity distributions, which cannot be predicted by the conventional ray-trace method. The alignment conditions with a focal length error of ≲ ±10 µm, incident angle error of ≲ ±0.5 µrad, and in-plane rotation angle error of ≲ ±0.25 µrad must be satisfied for nano-focusing.

Authors:

Yumoto, Hirokatsu; Koyama, Takahisa ^[1]; Matsuyama, Satoshi; Yamauchi, Kazuto ^[2]; Ohashi, Haruhiko ^[1]

Japan Synchrotron Radiation Research Institute/SPring-8, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5198 (Japan)
Department of Precision Science and Technology, Graduate School of Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871 (Japan)

Publication Date:: 2016-01-28

OSTI Identifier:: 22494397

Resource Type:: Journal Article

Journal Name:: AIP Conference Proceedings

Additional Journal Information:: Journal Volume: 1696; Journal Issue: 1; Conference: XRM 2014: 12. international conference on X-ray microscopy, Melbourne (Australia), 26-31 Oct 2014; Other Information: (c) 2016 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X

Country of Publication:: United States

Language:: English

Subject:: 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ACCURACY; ALIGNMENT; DIFFRACTION; DISTRIBUTION; ERRORS; FABRICATION; FOCUSING; HARD X RADIATION; INTERFERENCE; KEV RANGE 01-10; MIRRORS; SIMULATORS; TOLERANCE

Citation Formats


                    Yumoto, Hirokatsu, Koyama, Takahisa, Matsuyama, Satoshi, Yamauchi, Kazuto, Ohashi, Haruhiko, and RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148. Wave-optical assessment of alignment tolerances in nano-focusing with ellipsoidal mirror.  United States: N. p., 2016. 
        Web.  doi:10.1063/1.4937527.

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                    Yumoto, Hirokatsu, Koyama, Takahisa, Matsuyama, Satoshi, Yamauchi, Kazuto, Ohashi, Haruhiko, & RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148. Wave-optical assessment of alignment tolerances in nano-focusing with ellipsoidal mirror.  United States.  https://doi.org/10.1063/1.4937527

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                    Yumoto, Hirokatsu, Koyama, Takahisa, Matsuyama, Satoshi, Yamauchi, Kazuto, Ohashi, Haruhiko, and RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148. Thu .  
        "Wave-optical assessment of alignment tolerances in nano-focusing with ellipsoidal mirror".  United States.  https://doi.org/10.1063/1.4937527.

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@article{osti_22494397,

  title        = {Wave-optical assessment of alignment tolerances in nano-focusing with ellipsoidal mirror},

  author       = {Yumoto, Hirokatsu and Koyama, Takahisa and Matsuyama, Satoshi and Yamauchi, Kazuto and Ohashi, Haruhiko and RIKEN SPring-8 Center, 1-1-1 Kouto, Sayo-cho, Sayo-gun, Hyogo 679-5148},

  abstractNote = {High-precision ellipsoidal mirrors, which can efficiently focus X-rays to the nanometer dimension with a mirror, have not been realized because of the difficulties in the fabrication process. The purpose of our study was to develop nano-focusing ellipsoidal mirrors in the hard X-ray region. We developed a wave-optical focusing simulator for investigating alignment tolerances in nano-focusing with a designed ellipsoidal mirror, which produce a diffraction-limited focus size of 30 × 35 nm{sup 2} in full width at half maximum at an X-ray energy of 7 keV. The simulator can calculate focusing intensity distributions around the focal point under conditions of misalignment. The wave-optical simulator enabled the calculation of interference intensity distributions, which cannot be predicted by the conventional ray-trace method. The alignment conditions with a focal length error of ≲ ±10 µm, incident angle error of ≲ ±0.5 µrad, and in-plane rotation angle error of ≲ ±0.25 µrad must be satisfied for nano-focusing.},

  doi          = {10.1063/1.4937527},

  url          = {https://www.osti.gov/biblio/22494397},
  journal      = {AIP Conference Proceedings},

  issn         = {0094-243X},

  number       = 1,

  volume       = 1696,

  place        = {United States},

  year         = {2016},

  month        = {1}

}

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https://doi.org/10.1063/1.4937527

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