Threshold switching behavior of Ag-Si based selector device and hydrogen doping effect on its characteristics
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), 77 Cheongam-ro, Nam-gu, Pohang, 790-784 (Korea, Republic of)
The effect of hydrogen treatment on the threshold switching property in a Ag/amorphous Si based programmable metallization cells was investigated for selector device applications. Using the Ag filament formed during motion of Ag ions, a steep-slope (5 mV/dec.) for threshold switching with higher selectivity (∼10{sup 5}) could be achieved. Because of the faster diffusivity of Ag atoms, which are inside solid-electrolytes, the resulting Ag filament could easily be dissolved under low current regime, where the Ag filament possesses weak stability. We found that the dissolution process could be further enhanced by hydrogen treatment that facilitated the movement of the Ag atoms.
- OSTI ID:
- 22492246
- Journal Information:
- AIP Advances, Vol. 5, Issue 12; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA); ISSN 2158-3226
- Country of Publication:
- United States
- Language:
- English
Similar Records
Bidirectional threshold switching characteristics in Ag/ZrO{sub 2}/Pt electrochemical metallization cells
Bidirectional threshold switching in engineered multilayer (Cu{sub 2}O/Ag:Cu{sub 2}O/Cu{sub 2}O) stack for cross-point selector application
Steep-slope field-effect transistors with AlGaN/GaN HEMT and oxide-based threshold switching device
Journal Article
·
Mon Aug 15 00:00:00 EDT 2016
· AIP Advances
·
OSTI ID:22492246
+2 more
Bidirectional threshold switching in engineered multilayer (Cu{sub 2}O/Ag:Cu{sub 2}O/Cu{sub 2}O) stack for cross-point selector application
Journal Article
·
Mon Sep 14 00:00:00 EDT 2015
· Applied Physics Letters
·
OSTI ID:22492246
+4 more
Steep-slope field-effect transistors with AlGaN/GaN HEMT and oxide-based threshold switching device
Journal Article
·
Wed Mar 13 00:00:00 EDT 2019
· Nanotechnology
·
OSTI ID:22492246
+10 more