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Title: Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films

Abstract

Sputtering has been well-developed industrially with singular ambient gases including neutral argon (Ar), oxygen (O{sub 2}), hydrogen (H{sub 2}) and nitrogen (N{sub 2}) to enhance the electrical and optical performances of indium tin oxide (ITO) films. Recent preliminary investigation into the use of combined ambient gases such as an Ar+O{sub 2}+H{sub 2} ambient mixture, which was suitable for producing high-quality (low sheet resistance and high optical transmittance) of ITO films. To build on this promising preliminary work and develop deeper insight into the effect of ambient atmospheres on ITO film growth, this study provides a more detailed investigation of the effects of ambient combinations of Ar, O{sub 2}, H{sub 2} on sputtered ITO films. Thin films of ITO were deposited on glass substrates by DC magnetron sputtering using three different ambient combinations: Ar, Ar+O{sub 2} and Ar+O{sub 2}+H{sub 2}. The structural, electrical and optical properties of the three ambient sputtered ITO films were systematically characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman spectroscopy, four probe electrical conductivity and optical spectroscopy. The XRD and Raman studies confirmed the cubic indium oxide structure, which is polycrystalline at room temperature for all the samples. AFM shows themore » minimum surface roughness of 2.7 nm for Ar+O{sub 2}+H{sub 2} sputtered thin film material. The thickness of the films was determined by the cross sectional SEM analysis and its thickness was varied from 920 to 817 nm. The columnar growth of ITO films was also discussed here. The electrical and optical measurements of Ar+O{sub 2}+H{sub 2} ambient combinations shows a decreased sheet resistance (5.06 ohm/□) and increased optical transmittance (69%) than other samples. The refractive index and packing density of the films were projected using optical transmission spectrum. From the observed results the Ar+O{sub 2}+H{sub 2} ambient is a good choice to enhance the total optoelectronic properties of the ITO films. The improved electrical and optical properties of ITO films with respect to the Ar+O{sub 2}+H{sub 2} ambient sample were discussed in detail. In addition, the physical properties were also discussed with the influence of this ambient combination with respect to Ar, Ar+O{sub 2} and Ar+O{sub 2}+H{sub 2}.« less

Authors:
 [1]; ;  [2];  [1];  [3];  [4];  [5];  [3]
  1. Department of Materials Science, School of Chemistry, Madurai Kamaraj University, Tamil Nadu, Madurai-625021 (India)
  2. Department of Frontier Materials, Graduate School of Engineering, Nagoya Institute of Technology, Gokiso-cho, Showa-ku, Nagoya 466-8555 (Japan)
  3. (United States)
  4. Department of Physics, Centre for Materials Science and Nanotechnology, University of Oslo, P.O. Box 1126 Blindern, N-0318 Oslo (Norway)
  5. Department of Materials Science and Engineering, Michigan Technological University (United States)
Publication Date:
OSTI Identifier:
22454428
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Advances; Journal Volume: 5; Journal Issue: 1; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ARGON; ATOMIC FORCE MICROSCOPY; DEPOSITS; ELECTRIC CONDUCTIVITY; GLASS; HYDROGEN; INDIUM; INDIUM OXIDES; MAGNETRONS; OXYGEN; POLYCRYSTALS; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SPUTTERING; THICKNESS; THIN FILMS; TIN OXIDES; X-RAY DIFFRACTION

Citation Formats

Marikkannan, M., Subramanian, M., Tanemura, M., Mayandi, J., E-mail: pearce@mtu.edu, E-mail: jeyanthinath@yahoo.co.in, Department of Materials Science and Engineering, Michigan Technological University, Vishnukanthan, V., Pearce, J. M., E-mail: pearce@mtu.edu, E-mail: jeyanthinath@yahoo.co.in, and Department of Electrical and Computer Engineering, Michigan Technological University. Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films. United States: N. p., 2015. Web. doi:10.1063/1.4906566.
Marikkannan, M., Subramanian, M., Tanemura, M., Mayandi, J., E-mail: pearce@mtu.edu, E-mail: jeyanthinath@yahoo.co.in, Department of Materials Science and Engineering, Michigan Technological University, Vishnukanthan, V., Pearce, J. M., E-mail: pearce@mtu.edu, E-mail: jeyanthinath@yahoo.co.in, & Department of Electrical and Computer Engineering, Michigan Technological University. Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films. United States. doi:10.1063/1.4906566.
Marikkannan, M., Subramanian, M., Tanemura, M., Mayandi, J., E-mail: pearce@mtu.edu, E-mail: jeyanthinath@yahoo.co.in, Department of Materials Science and Engineering, Michigan Technological University, Vishnukanthan, V., Pearce, J. M., E-mail: pearce@mtu.edu, E-mail: jeyanthinath@yahoo.co.in, and Department of Electrical and Computer Engineering, Michigan Technological University. Thu . "Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films". United States. doi:10.1063/1.4906566.
@article{osti_22454428,
title = {Effect of ambient combinations of argon, oxygen, and hydrogen on the properties of DC magnetron sputtered indium tin oxide films},
author = {Marikkannan, M. and Subramanian, M. and Tanemura, M. and Mayandi, J., E-mail: pearce@mtu.edu, E-mail: jeyanthinath@yahoo.co.in and Department of Materials Science and Engineering, Michigan Technological University and Vishnukanthan, V. and Pearce, J. M., E-mail: pearce@mtu.edu, E-mail: jeyanthinath@yahoo.co.in and Department of Electrical and Computer Engineering, Michigan Technological University},
abstractNote = {Sputtering has been well-developed industrially with singular ambient gases including neutral argon (Ar), oxygen (O{sub 2}), hydrogen (H{sub 2}) and nitrogen (N{sub 2}) to enhance the electrical and optical performances of indium tin oxide (ITO) films. Recent preliminary investigation into the use of combined ambient gases such as an Ar+O{sub 2}+H{sub 2} ambient mixture, which was suitable for producing high-quality (low sheet resistance and high optical transmittance) of ITO films. To build on this promising preliminary work and develop deeper insight into the effect of ambient atmospheres on ITO film growth, this study provides a more detailed investigation of the effects of ambient combinations of Ar, O{sub 2}, H{sub 2} on sputtered ITO films. Thin films of ITO were deposited on glass substrates by DC magnetron sputtering using three different ambient combinations: Ar, Ar+O{sub 2} and Ar+O{sub 2}+H{sub 2}. The structural, electrical and optical properties of the three ambient sputtered ITO films were systematically characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), scanning electron microscopy (SEM), Raman spectroscopy, four probe electrical conductivity and optical spectroscopy. The XRD and Raman studies confirmed the cubic indium oxide structure, which is polycrystalline at room temperature for all the samples. AFM shows the minimum surface roughness of 2.7 nm for Ar+O{sub 2}+H{sub 2} sputtered thin film material. The thickness of the films was determined by the cross sectional SEM analysis and its thickness was varied from 920 to 817 nm. The columnar growth of ITO films was also discussed here. The electrical and optical measurements of Ar+O{sub 2}+H{sub 2} ambient combinations shows a decreased sheet resistance (5.06 ohm/□) and increased optical transmittance (69%) than other samples. The refractive index and packing density of the films were projected using optical transmission spectrum. From the observed results the Ar+O{sub 2}+H{sub 2} ambient is a good choice to enhance the total optoelectronic properties of the ITO films. The improved electrical and optical properties of ITO films with respect to the Ar+O{sub 2}+H{sub 2} ambient sample were discussed in detail. In addition, the physical properties were also discussed with the influence of this ambient combination with respect to Ar, Ar+O{sub 2} and Ar+O{sub 2}+H{sub 2}.},
doi = {10.1063/1.4906566},
journal = {AIP Advances},
number = 1,
volume = 5,
place = {United States},
year = {Thu Jan 15 00:00:00 EST 2015},
month = {Thu Jan 15 00:00:00 EST 2015}
}