Simulation study of HEMT structures with HfO{sub 2} cap layer for mitigating inverse piezoelectric effect related device failures
Abstract
The Inverse Piezoelectric Effect (IPE) is thought to contribute to possible device failure of GaN High Electron Mobility Transistors (HEMTs). Here we focus on a simulation study to probe the possible mitigation of the IPE by reducing the internal electric fields and related elastic energy through the use of high-k materials. Inclusion of a HfO{sub 2} “cap layer” above the AlGaN barrier particularly with a partial mesa structure is shown to have potential advantages. Simulations reveal even greater reductions in the internal electric fields by using “field plates” in concert with high-k oxides.
- Authors:
-
- Department of Engineering and Center for Materials Research, Norfolk State University, 700 Park Avenue, Norfolk, VA 23504 (United States)
- Publication Date:
- OSTI Identifier:
- 22454415
- Resource Type:
- Journal Article
- Journal Name:
- AIP Advances
- Additional Journal Information:
- Journal Volume: 5; Journal Issue: 1; Other Information: (c) 2015 Author(s); Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 2158-3226
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; ALUMINIUM COMPOUNDS; ELECTRIC FIELDS; ELECTRON MOBILITY; EQUIPMENT; GALLIUM NITRIDES; HAFNIUM OXIDES; INCLUSIONS; LAYERS; PIEZOELECTRICITY; SIMULATION
Citation Formats
Nagulapally, Deepthi, Joshi, Ravi P., E-mail: rjoshi@odu.edu, and Pradhan, Aswini. Simulation study of HEMT structures with HfO{sub 2} cap layer for mitigating inverse piezoelectric effect related device failures. United States: N. p., 2015.
Web. doi:10.1063/1.4905702.
Nagulapally, Deepthi, Joshi, Ravi P., E-mail: rjoshi@odu.edu, & Pradhan, Aswini. Simulation study of HEMT structures with HfO{sub 2} cap layer for mitigating inverse piezoelectric effect related device failures. United States. https://doi.org/10.1063/1.4905702
Nagulapally, Deepthi, Joshi, Ravi P., E-mail: rjoshi@odu.edu, and Pradhan, Aswini. 2015.
"Simulation study of HEMT structures with HfO{sub 2} cap layer for mitigating inverse piezoelectric effect related device failures". United States. https://doi.org/10.1063/1.4905702.
@article{osti_22454415,
title = {Simulation study of HEMT structures with HfO{sub 2} cap layer for mitigating inverse piezoelectric effect related device failures},
author = {Nagulapally, Deepthi and Joshi, Ravi P., E-mail: rjoshi@odu.edu and Pradhan, Aswini},
abstractNote = {The Inverse Piezoelectric Effect (IPE) is thought to contribute to possible device failure of GaN High Electron Mobility Transistors (HEMTs). Here we focus on a simulation study to probe the possible mitigation of the IPE by reducing the internal electric fields and related elastic energy through the use of high-k materials. Inclusion of a HfO{sub 2} “cap layer” above the AlGaN barrier particularly with a partial mesa structure is shown to have potential advantages. Simulations reveal even greater reductions in the internal electric fields by using “field plates” in concert with high-k oxides.},
doi = {10.1063/1.4905702},
url = {https://www.osti.gov/biblio/22454415},
journal = {AIP Advances},
issn = {2158-3226},
number = 1,
volume = 5,
place = {United States},
year = {Thu Jan 15 00:00:00 EST 2015},
month = {Thu Jan 15 00:00:00 EST 2015}
}
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