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Title: Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control

Abstract

Plasmonic lithography has been used in nanofabrication because of its utility beyond the diffraction limit. The resolution of plasmonic lithography depends on the nano-gap between the nanoaperture and the photoresist surface—changing the gap distance can modulate the line-width of the pattern. In this letter, we demonstrate solid-immersion lens based active non-contact plasmonic lithography, applying a range of gap conditions to modulate the line-width of the pattern. Using a solid-immersion lens-based near-field control system, the nano-gap between the exit surface of the nanoaperture and the media can be actively modulated and maintained to within a few nanometers. The line-widths of the recorded patterns using 15- and 5-nm gaps were 47 and 19.5 nm, respectively, which matched closely the calculated full-width at half-maximum. From these results, we conclude that changing the nano-gap within a solid-immersion lens-based plasmonic head results in varying line-width patterns.

Authors:
; ; ; ; ; ; ;  [1]; ; ;  [2]
  1. School of Mechanical Engineering, Yonsei University, 50 Yonsei-ro, Sudaemungu, Seoul 120-749 (Korea, Republic of)
  2. Center for Information Storage Device, Yonsei University, 50 Yonsei-ro, Sudaemungu, Seoul 120-749 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22420237
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 5; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CONTROL SYSTEMS; FABRICATION; LINE WIDTHS; NANOSTRUCTURES; PLASMONS; RESOLUTION; SURFACES

Citation Formats

Lee, Won-Sup, Kim, Taeseob, Choi, Guk-Jong, Lim, Geon, Joe, Hang-Eun, Gang, Myeong-Gu, Min, Byung-Kwon, Park, No-Cheol, E-mail: pnch@yonsei.ac.kr, Moon, Hyungbae, Kim, Do-Hyung, and Park, Young-Pil. Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control. United States: N. p., 2015. Web. doi:10.1063/1.4907653.
Lee, Won-Sup, Kim, Taeseob, Choi, Guk-Jong, Lim, Geon, Joe, Hang-Eun, Gang, Myeong-Gu, Min, Byung-Kwon, Park, No-Cheol, E-mail: pnch@yonsei.ac.kr, Moon, Hyungbae, Kim, Do-Hyung, & Park, Young-Pil. Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control. United States. doi:10.1063/1.4907653.
Lee, Won-Sup, Kim, Taeseob, Choi, Guk-Jong, Lim, Geon, Joe, Hang-Eun, Gang, Myeong-Gu, Min, Byung-Kwon, Park, No-Cheol, E-mail: pnch@yonsei.ac.kr, Moon, Hyungbae, Kim, Do-Hyung, and Park, Young-Pil. Mon . "Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control". United States. doi:10.1063/1.4907653.
@article{osti_22420237,
title = {Experimental demonstration of line-width modulation in plasmonic lithography using a solid immersion lens-based active nano-gap control},
author = {Lee, Won-Sup and Kim, Taeseob and Choi, Guk-Jong and Lim, Geon and Joe, Hang-Eun and Gang, Myeong-Gu and Min, Byung-Kwon and Park, No-Cheol, E-mail: pnch@yonsei.ac.kr and Moon, Hyungbae and Kim, Do-Hyung and Park, Young-Pil},
abstractNote = {Plasmonic lithography has been used in nanofabrication because of its utility beyond the diffraction limit. The resolution of plasmonic lithography depends on the nano-gap between the nanoaperture and the photoresist surface—changing the gap distance can modulate the line-width of the pattern. In this letter, we demonstrate solid-immersion lens based active non-contact plasmonic lithography, applying a range of gap conditions to modulate the line-width of the pattern. Using a solid-immersion lens-based near-field control system, the nano-gap between the exit surface of the nanoaperture and the media can be actively modulated and maintained to within a few nanometers. The line-widths of the recorded patterns using 15- and 5-nm gaps were 47 and 19.5 nm, respectively, which matched closely the calculated full-width at half-maximum. From these results, we conclude that changing the nano-gap within a solid-immersion lens-based plasmonic head results in varying line-width patterns.},
doi = {10.1063/1.4907653},
journal = {Applied Physics Letters},
number = 5,
volume = 106,
place = {United States},
year = {Mon Feb 02 00:00:00 EST 2015},
month = {Mon Feb 02 00:00:00 EST 2015}
}