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Title: Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires

Abstract

A nonselective micropatterning method of self-assembled monolayers (SAMs) based on laser and phase-shifting mask (PSM) is demonstrated. Laser beam is spatially modulated by a PSM, and periodic SAM patterns are generated sequentially through thermal desorption. Patterned wettability is achieved with alternating hydrophilic/hydrophobic stripes on octadecyltrichlorosilane monolayers. The substrate is then used to assemble CdS semiconductor nanowires (NWs) from a solution, obtaining well-aligned NWs in one step. Our results show valuably the application potential of this technique in engineering SAMs for integration of functional devices.

Authors:
; ; ; ; ; ;  [1];  [1];  [2]; ; ;  [1];  [2]
  1. Key Laboratory of Advanced Photonic and Electronic Materials and School of Electronic Science and Engineering, Nanjing University, Nanjing 210093 (China)
  2. (China)
Publication Date:
OSTI Identifier:
22415181
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 4; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; CADMIUM SULFIDES; DESORPTION; LASERS; MATHEMATICAL SOLUTIONS; MICROSTRUCTURE; NANOWIRES; SEMICONDUCTOR MATERIALS; SUBSTRATES

Citation Formats

Gao, Fan, Zhang, Dakuan, Wang, Jianyu, Sheng, Yun, Wang, Xinran, Chen, Kunji, Zhou, Minmin, Yan, Shancheng, School of Geography and Biological Information, Nanjing University of Posts and Telecommunications, Nanjing 210046, Shen, Jiancang, Pan, Lijia, Shi, Yi, E-mail: yshi@nju.edu.cn, and Collaborative Innovation Center of Advanced Micro-structures, Nanjing University, Nanjing 210093. Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires. United States: N. p., 2015. Web. doi:10.1063/1.4907042.
Gao, Fan, Zhang, Dakuan, Wang, Jianyu, Sheng, Yun, Wang, Xinran, Chen, Kunji, Zhou, Minmin, Yan, Shancheng, School of Geography and Biological Information, Nanjing University of Posts and Telecommunications, Nanjing 210046, Shen, Jiancang, Pan, Lijia, Shi, Yi, E-mail: yshi@nju.edu.cn, & Collaborative Innovation Center of Advanced Micro-structures, Nanjing University, Nanjing 210093. Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires. United States. doi:10.1063/1.4907042.
Gao, Fan, Zhang, Dakuan, Wang, Jianyu, Sheng, Yun, Wang, Xinran, Chen, Kunji, Zhou, Minmin, Yan, Shancheng, School of Geography and Biological Information, Nanjing University of Posts and Telecommunications, Nanjing 210046, Shen, Jiancang, Pan, Lijia, Shi, Yi, E-mail: yshi@nju.edu.cn, and Collaborative Innovation Center of Advanced Micro-structures, Nanjing University, Nanjing 210093. Mon . "Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires". United States. doi:10.1063/1.4907042.
@article{osti_22415181,
title = {Patterning of self-assembled monolayers by phase-shifting mask and its applications in large-scale assembly of nanowires},
author = {Gao, Fan and Zhang, Dakuan and Wang, Jianyu and Sheng, Yun and Wang, Xinran and Chen, Kunji and Zhou, Minmin and Yan, Shancheng and School of Geography and Biological Information, Nanjing University of Posts and Telecommunications, Nanjing 210046 and Shen, Jiancang and Pan, Lijia and Shi, Yi, E-mail: yshi@nju.edu.cn and Collaborative Innovation Center of Advanced Micro-structures, Nanjing University, Nanjing 210093},
abstractNote = {A nonselective micropatterning method of self-assembled monolayers (SAMs) based on laser and phase-shifting mask (PSM) is demonstrated. Laser beam is spatially modulated by a PSM, and periodic SAM patterns are generated sequentially through thermal desorption. Patterned wettability is achieved with alternating hydrophilic/hydrophobic stripes on octadecyltrichlorosilane monolayers. The substrate is then used to assemble CdS semiconductor nanowires (NWs) from a solution, obtaining well-aligned NWs in one step. Our results show valuably the application potential of this technique in engineering SAMs for integration of functional devices.},
doi = {10.1063/1.4907042},
journal = {Applied Physics Letters},
number = 4,
volume = 106,
place = {United States},
year = {Mon Jan 26 00:00:00 EST 2015},
month = {Mon Jan 26 00:00:00 EST 2015}
}