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Title: The competing oxide and sub-oxide formation in metal-oxide molecular beam epitaxy

Abstract

The hetero-epitaxial growth of the n-type semiconducting oxides β-Ga{sub 2}O{sub 3}, In{sub 2}O{sub 3}, and SnO{sub 2} on c- and r-plane sapphire was performed by plasma-assisted molecular beam epitaxy. The growth-rate and desorbing flux from the substrate were measured in-situ under various oxygen to metal ratios by laser reflectometry and quadrupole mass spectrometry, respectively. These measurements clarified the role of volatile sub-oxide formation (Ga{sub 2}O, In{sub 2}O, and SnO) during growth, the sub-oxide stoichiometry, and the efficiency of oxide formation for the three oxides. As a result, the formation of the sub-oxides decreased the growth-rate under metal-rich growth conditions and resulted in etching of the oxide film by supplying only metal flux. The flux ratio for the exclusive formation of the sub-oxide (e.g., the p-type semiconductor SnO) was determined, and the efficiency of oxide formation was found to be the highest for SnO{sub 2}, somewhat lower for In{sub 2}O{sub 3}, and the lowest for Ga{sub 2}O{sub 3}. Our findings can be generalized to further oxides that possess related sub-oxides.

Authors:
;  [1]
  1. Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, D-10117 Berlin (Germany)
Publication Date:
OSTI Identifier:
22412690
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 106; Journal Issue: 8; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; AVAILABILITY; EFFICIENCY; ETCHING; FILMS; GALLIUM OXIDES; INDIUM OXIDES; LASER RADIATION; MASS SPECTROSCOPY; MOLECULAR BEAM EPITAXY; N-TYPE CONDUCTORS; PLASMA; SAPPHIRE; SUBSTRATES; TIN OXIDES

Citation Formats

Vogt, Patrick, and Bierwagen, Oliver. The competing oxide and sub-oxide formation in metal-oxide molecular beam epitaxy. United States: N. p., 2015. Web. doi:10.1063/1.4913447.
Vogt, Patrick, & Bierwagen, Oliver. The competing oxide and sub-oxide formation in metal-oxide molecular beam epitaxy. United States. doi:10.1063/1.4913447.
Vogt, Patrick, and Bierwagen, Oliver. Mon . "The competing oxide and sub-oxide formation in metal-oxide molecular beam epitaxy". United States. doi:10.1063/1.4913447.
@article{osti_22412690,
title = {The competing oxide and sub-oxide formation in metal-oxide molecular beam epitaxy},
author = {Vogt, Patrick and Bierwagen, Oliver},
abstractNote = {The hetero-epitaxial growth of the n-type semiconducting oxides β-Ga{sub 2}O{sub 3}, In{sub 2}O{sub 3}, and SnO{sub 2} on c- and r-plane sapphire was performed by plasma-assisted molecular beam epitaxy. The growth-rate and desorbing flux from the substrate were measured in-situ under various oxygen to metal ratios by laser reflectometry and quadrupole mass spectrometry, respectively. These measurements clarified the role of volatile sub-oxide formation (Ga{sub 2}O, In{sub 2}O, and SnO) during growth, the sub-oxide stoichiometry, and the efficiency of oxide formation for the three oxides. As a result, the formation of the sub-oxides decreased the growth-rate under metal-rich growth conditions and resulted in etching of the oxide film by supplying only metal flux. The flux ratio for the exclusive formation of the sub-oxide (e.g., the p-type semiconductor SnO) was determined, and the efficiency of oxide formation was found to be the highest for SnO{sub 2}, somewhat lower for In{sub 2}O{sub 3}, and the lowest for Ga{sub 2}O{sub 3}. Our findings can be generalized to further oxides that possess related sub-oxides.},
doi = {10.1063/1.4913447},
journal = {Applied Physics Letters},
number = 8,
volume = 106,
place = {United States},
year = {Mon Feb 23 00:00:00 EST 2015},
month = {Mon Feb 23 00:00:00 EST 2015}
}