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Title: Properties of three-dimensional structures prepared by Ge dewetting from Si(111) at high temperatures

Abstract

The formation of three-dimensional (3D) structures during Ge deposition on Si(111) at about 800 °C is studied with scanning tunneling, Kelvin probe and electron microscopies, and scanning tunneling and Raman spectroscopies. The observed surface morphology is formed by dewetting of Ge from Si(111), since it occurs mainly by means of minimization of surface and interfacial energies. The dewetting proceeds through massive Si eroding around growing 3D structures, providing them to be composed of SiGe with about a 30% Ge content, and leads to the significant reduction of the SiGe/Si interface area. It is found that the SiGe top component of 3D structures forms sharp interfaces with the underlying Si. The minimization of interfacial and strain energies occurs on the way that the 3D structures appear to get the dendrite-like shape. The Ge distribution in the 3D SiGe structures is inhomogeneous in the lateral dimension with a higher Ge concentration in their central areas and Ge segregation on their surface.

Authors:
 [1];  [2]; ; ;  [3]
  1. A. V. Rzhanov Institute of Semiconductor Physics, SB RAS, Novosibirsk 630090 (Russian Federation)
  2. (Russian Federation)
  3. National Institute of Advanced Industrial Science and Technology, Higashi 1-1-1, Tsukuba, Ibaraki 305-8562 (Japan)
Publication Date:
OSTI Identifier:
22410259
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 117; Journal Issue: 20; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CONCENTRATION RATIO; DENDRITES; DEPOSITION; ELECTRON MICROSCOPY; GERMANIUM; GERMANIUM SILICIDES; INTERFACES; MORPHOLOGY; RAMAN SPECTROSCOPY; SILICON; STRAINS; SURFACES; TEMPERATURE DEPENDENCE; THREE-DIMENSIONAL LATTICES; TUNNEL EFFECT

Citation Formats

Shklyaev, Alexander, E-mail: shklyaev@isp.nsc.ru, Novosibirsk State University, Novosibirsk 630090, Bolotov, Leonid, Poborchii, Vladimir, and Tada, Tetsuya. Properties of three-dimensional structures prepared by Ge dewetting from Si(111) at high temperatures. United States: N. p., 2015. Web. doi:10.1063/1.4921596.
Shklyaev, Alexander, E-mail: shklyaev@isp.nsc.ru, Novosibirsk State University, Novosibirsk 630090, Bolotov, Leonid, Poborchii, Vladimir, & Tada, Tetsuya. Properties of three-dimensional structures prepared by Ge dewetting from Si(111) at high temperatures. United States. doi:10.1063/1.4921596.
Shklyaev, Alexander, E-mail: shklyaev@isp.nsc.ru, Novosibirsk State University, Novosibirsk 630090, Bolotov, Leonid, Poborchii, Vladimir, and Tada, Tetsuya. Thu . "Properties of three-dimensional structures prepared by Ge dewetting from Si(111) at high temperatures". United States. doi:10.1063/1.4921596.
@article{osti_22410259,
title = {Properties of three-dimensional structures prepared by Ge dewetting from Si(111) at high temperatures},
author = {Shklyaev, Alexander, E-mail: shklyaev@isp.nsc.ru and Novosibirsk State University, Novosibirsk 630090 and Bolotov, Leonid and Poborchii, Vladimir and Tada, Tetsuya},
abstractNote = {The formation of three-dimensional (3D) structures during Ge deposition on Si(111) at about 800 °C is studied with scanning tunneling, Kelvin probe and electron microscopies, and scanning tunneling and Raman spectroscopies. The observed surface morphology is formed by dewetting of Ge from Si(111), since it occurs mainly by means of minimization of surface and interfacial energies. The dewetting proceeds through massive Si eroding around growing 3D structures, providing them to be composed of SiGe with about a 30% Ge content, and leads to the significant reduction of the SiGe/Si interface area. It is found that the SiGe top component of 3D structures forms sharp interfaces with the underlying Si. The minimization of interfacial and strain energies occurs on the way that the 3D structures appear to get the dendrite-like shape. The Ge distribution in the 3D SiGe structures is inhomogeneous in the lateral dimension with a higher Ge concentration in their central areas and Ge segregation on their surface.},
doi = {10.1063/1.4921596},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 20,
volume = 117,
place = {United States},
year = {2015},
month = {5}
}