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Title: Mössbauer study on epitaxial Co{sub x}Fe{sub 4−x}N films grown by molecular beam epitaxy

Abstract

We prepared Co{sub x}Fe{sub 4−x}N (x = 0, 1, 3) films on SrTiO{sub 3}(STO)(001) substrates by molecular beam epitaxy. The epitaxial relationship with Co{sub x}Fe{sub 4−x}N[100](001) || STO[100](001) was confirmed by ω-2θ (out-of-plane) and ϕ-2θ{sub χ} (in-plane) x-ray diffraction (XRD) measurements. The degree of order of atoms (S) in the Co{sub x}Fe{sub 4−x}N films was estimated to be ∼0.5 by the peak intensity ratio of Co{sub x}Fe{sub 4−x}N(100) (superlattice diffraction line) to (400) (fundamental diffraction line) in the ϕ-2θ{sub χ} XRD patterns. Conversion electron Mössbauer spectroscopy studies for the Co{sub x}Fe{sub 4−x}N films revealed that some N atoms are located at interstitial sites between the two nearest corner sites in the Co{sub x}Fe{sub 4−x}N films, and/or Fe atoms are located at both the corner and face-centered sites in the CoFe{sub 3}N and Co{sub 3}FeN films. In order to realize high spin-polarized Co{sub x}Fe{sub 4−x}N films having large S, further optimization of growth condition is required to prevent the site-disorders.

Authors:
 [1];  [2];  [3]; ; ; ; ; ; ;  [1];  [4]
  1. Institute of Applied Physics, Graduate School of Pure and Applied Sciences, University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573 (Japan)
  2. (JSPS), 5-3-1 Kojimachi, Chiyoda-ku, Tokyo 102-0083 (Japan)
  3. (Japan)
  4. Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-05 Aobayama, Sendai 980-8579 (Japan)
Publication Date:
OSTI Identifier:
22409973
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 117; Journal Issue: 17; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; COBALT COMPOUNDS; CONCENTRATION RATIO; CRYSTAL GROWTH; ELECTRONS; FILMS; IRON NITRIDES; MOESSBAUER EFFECT; MOLECULAR BEAM EPITAXY; OPTIMIZATION; SPIN ORIENTATION; STRONTIUM TITANATES; SUBSTRATES; SUPERLATTICES; X-RAY DIFFRACTION

Citation Formats

Ito, Keita, E-mail: keita.ito.729@gmail.com, Japan Society for the Promotion of Science, Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-05 Aobayama, Sendai 980-8579, Sanai, Tatsunori, Yasutomi, Yoko, Gushi, Toshiki, Toko, Kaoru, Yanagihara, Hideto, Kita, Eiji, Suemasu, Takashi, and Tsunoda, Masakiyo. Mössbauer study on epitaxial Co{sub x}Fe{sub 4−x}N films grown by molecular beam epitaxy. United States: N. p., 2015. Web. doi:10.1063/1.4914342.
Ito, Keita, E-mail: keita.ito.729@gmail.com, Japan Society for the Promotion of Science, Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-05 Aobayama, Sendai 980-8579, Sanai, Tatsunori, Yasutomi, Yoko, Gushi, Toshiki, Toko, Kaoru, Yanagihara, Hideto, Kita, Eiji, Suemasu, Takashi, & Tsunoda, Masakiyo. Mössbauer study on epitaxial Co{sub x}Fe{sub 4−x}N films grown by molecular beam epitaxy. United States. doi:10.1063/1.4914342.
Ito, Keita, E-mail: keita.ito.729@gmail.com, Japan Society for the Promotion of Science, Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-05 Aobayama, Sendai 980-8579, Sanai, Tatsunori, Yasutomi, Yoko, Gushi, Toshiki, Toko, Kaoru, Yanagihara, Hideto, Kita, Eiji, Suemasu, Takashi, and Tsunoda, Masakiyo. Thu . "Mössbauer study on epitaxial Co{sub x}Fe{sub 4−x}N films grown by molecular beam epitaxy". United States. doi:10.1063/1.4914342.
@article{osti_22409973,
title = {Mössbauer study on epitaxial Co{sub x}Fe{sub 4−x}N films grown by molecular beam epitaxy},
author = {Ito, Keita, E-mail: keita.ito.729@gmail.com and Japan Society for the Promotion of Science and Department of Electronic Engineering, Graduate School of Engineering, Tohoku University, 6-6-05 Aobayama, Sendai 980-8579 and Sanai, Tatsunori and Yasutomi, Yoko and Gushi, Toshiki and Toko, Kaoru and Yanagihara, Hideto and Kita, Eiji and Suemasu, Takashi and Tsunoda, Masakiyo},
abstractNote = {We prepared Co{sub x}Fe{sub 4−x}N (x = 0, 1, 3) films on SrTiO{sub 3}(STO)(001) substrates by molecular beam epitaxy. The epitaxial relationship with Co{sub x}Fe{sub 4−x}N[100](001) || STO[100](001) was confirmed by ω-2θ (out-of-plane) and ϕ-2θ{sub χ} (in-plane) x-ray diffraction (XRD) measurements. The degree of order of atoms (S) in the Co{sub x}Fe{sub 4−x}N films was estimated to be ∼0.5 by the peak intensity ratio of Co{sub x}Fe{sub 4−x}N(100) (superlattice diffraction line) to (400) (fundamental diffraction line) in the ϕ-2θ{sub χ} XRD patterns. Conversion electron Mössbauer spectroscopy studies for the Co{sub x}Fe{sub 4−x}N films revealed that some N atoms are located at interstitial sites between the two nearest corner sites in the Co{sub x}Fe{sub 4−x}N films, and/or Fe atoms are located at both the corner and face-centered sites in the CoFe{sub 3}N and Co{sub 3}FeN films. In order to realize high spin-polarized Co{sub x}Fe{sub 4−x}N films having large S, further optimization of growth condition is required to prevent the site-disorders.},
doi = {10.1063/1.4914342},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 17,
volume = 117,
place = {United States},
year = {2015},
month = {5}
}