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Title: Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems

Abstract

A comparative study of photoionized plasmas created by two soft X-ray and extreme ultraviolet (SXR/EUV) laser plasma sources with different parameters is presented. The two sources are based on double-stream Xe/He gas-puff targets irradiated with high (500 J/0.3 ns) and low energy (10 J/1 ns) laser pulses. In both cases, the SXR/EUV beam irradiated the gas stream, injected into a vacuum chamber synchronously with the radiation pulse. Irradiation of gases resulted in formation of photoionized plasmas emitting radiation in the SXR/EUV range. The measured Ne plasma radiation spectra are dominated by emission lines corresponding to radiative transitions in singly charged ions. A significant difference concerns origin of the lines: K-shell or L-shell emissions occur in case of the high and low energy irradiating system, respectively. In high energy system, the electron density measurements were also performed by laser interferometry, employing a femtosecond laser system. A maximum electron density for Ne plasma reached the value of 2·10{sup 18 }cm{sup −3}. For the low energy system, a detection limit was too high for the interferometric measurements, thus only an upper estimation for electron density could be made.

Authors:
; ; ; ;  [1]; ; ;  [2]; ; ; ; ; ; ;  [3]
  1. Institute of Optoelectronics, Military University of Technology, Kaliskiego 2, 00-908 Warsaw (Poland)
  2. Institute of Plasma Physics and Laser Microfusion, 23 Hery St., 00-908 Warsaw (Poland)
  3. Institute of Plasma Physics ASCR, Prague, Czech Republic and Institute of Physics ASCR, Prague (Czech Republic)
Publication Date:
OSTI Identifier:
22408360
Resource Type:
Journal Article
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 22; Journal Issue: 4; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1070-664X
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ELECTRON DENSITY; EXTREME ULTRAVIOLET RADIATION; HELIUM; INTERFEROMETRY; IONS; K SHELL; L SHELL; LASER-PRODUCED PLASMA; NEON; PHOTOIONIZATION; PHOTON BEAMS; PULSED IRRADIATION; SENSITIVITY; SOFT X RADIATION; SPECTRA; XENON; X-RAY LASERS

Citation Formats

Bartnik, A., Wachulak, P., Fok, T., Węgrzyński, Ł., Fiedorowicz, H., Pisarczyk, T., Chodukowski, T., Kalinowska, Z., Dudzak, R., Dostal, J., Krousky, E., Skala, J., Ullschmied, J., Hrebicek, J., and Medrik, T. Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems. United States: N. p., 2015. Web. doi:10.1063/1.4919024.
Bartnik, A., Wachulak, P., Fok, T., Węgrzyński, Ł., Fiedorowicz, H., Pisarczyk, T., Chodukowski, T., Kalinowska, Z., Dudzak, R., Dostal, J., Krousky, E., Skala, J., Ullschmied, J., Hrebicek, J., & Medrik, T. Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems. United States. https://doi.org/10.1063/1.4919024
Bartnik, A., Wachulak, P., Fok, T., Węgrzyński, Ł., Fiedorowicz, H., Pisarczyk, T., Chodukowski, T., Kalinowska, Z., Dudzak, R., Dostal, J., Krousky, E., Skala, J., Ullschmied, J., Hrebicek, J., and Medrik, T. 2015. "Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems". United States. https://doi.org/10.1063/1.4919024.
@article{osti_22408360,
title = {Photoionized plasmas induced in neon with extreme ultraviolet and soft X-ray pulses produced using low and high energy laser systems},
author = {Bartnik, A. and Wachulak, P. and Fok, T. and Węgrzyński, Ł. and Fiedorowicz, H. and Pisarczyk, T. and Chodukowski, T. and Kalinowska, Z. and Dudzak, R. and Dostal, J. and Krousky, E. and Skala, J. and Ullschmied, J. and Hrebicek, J. and Medrik, T.},
abstractNote = {A comparative study of photoionized plasmas created by two soft X-ray and extreme ultraviolet (SXR/EUV) laser plasma sources with different parameters is presented. The two sources are based on double-stream Xe/He gas-puff targets irradiated with high (500 J/0.3 ns) and low energy (10 J/1 ns) laser pulses. In both cases, the SXR/EUV beam irradiated the gas stream, injected into a vacuum chamber synchronously with the radiation pulse. Irradiation of gases resulted in formation of photoionized plasmas emitting radiation in the SXR/EUV range. The measured Ne plasma radiation spectra are dominated by emission lines corresponding to radiative transitions in singly charged ions. A significant difference concerns origin of the lines: K-shell or L-shell emissions occur in case of the high and low energy irradiating system, respectively. In high energy system, the electron density measurements were also performed by laser interferometry, employing a femtosecond laser system. A maximum electron density for Ne plasma reached the value of 2·10{sup 18 }cm{sup −3}. For the low energy system, a detection limit was too high for the interferometric measurements, thus only an upper estimation for electron density could be made.},
doi = {10.1063/1.4919024},
url = {https://www.osti.gov/biblio/22408360}, journal = {Physics of Plasmas},
issn = {1070-664X},
number = 4,
volume = 22,
place = {United States},
year = {Wed Apr 15 00:00:00 EDT 2015},
month = {Wed Apr 15 00:00:00 EDT 2015}
}