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Title: Improvement of thermal stability of amorphous CoFeSiB thin films

Abstract

The excellent soft magnetic properties of amorphous (a-) CoFeSiB films make it suited for use in the yoke of granular-in-gap sensors, but only if their thermal stability can be improved. To this end, this study investigated the effects of adding small amounts of other metals on the magnetic and structural properties of a-CoFeSiB films. It was found that adding metals with relatively large atomic radii is an effective way to increase thermal stability, with both Ta and Hf showing good thermal stability after annealing at temperatures of 473 to 573 K. Indeed, a -(CoFeSiB){sub 96.2}Hf{sub 3.8} film was found to maintain its initial coercivity of 0.2 Oe without very little decrease in magnetization after annealing at 623 K. Furthermore, even after annealing at 673 K a -(CoFeSiB){sub 93.0}Hf{sub 7.0} film still had a relatively low coercivity of approximately 0.5 Oe.

Authors:
;  [1];  [2]
  1. Department of Electrical and Electronic Engineering, Daido University, Nagoya 457-8530 (Japan)
  2. Graduate School of Engineering, Mie University, Mie 514-8507 (Japan)
Publication Date:
OSTI Identifier:
22403021
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 117; Journal Issue: 17; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; AMORPHOUS STATE; ANNEALING; APPROXIMATIONS; ATOMIC RADII; COBALT SILICIDES; COERCIVE FORCE; IRON BORIDES; MAGNETIC PROPERTIES; MAGNETIZATION; PHASE STABILITY; SENSORS; THIN FILMS

Citation Formats

Jimbo, M., E-mail: jimbo@daido-it.ac.jp, Shimizu, T., and Fujiwara, Y. Improvement of thermal stability of amorphous CoFeSiB thin films. United States: N. p., 2015. Web. doi:10.1063/1.4913817.
Jimbo, M., E-mail: jimbo@daido-it.ac.jp, Shimizu, T., & Fujiwara, Y. Improvement of thermal stability of amorphous CoFeSiB thin films. United States. doi:10.1063/1.4913817.
Jimbo, M., E-mail: jimbo@daido-it.ac.jp, Shimizu, T., and Fujiwara, Y. Thu . "Improvement of thermal stability of amorphous CoFeSiB thin films". United States. doi:10.1063/1.4913817.
@article{osti_22403021,
title = {Improvement of thermal stability of amorphous CoFeSiB thin films},
author = {Jimbo, M., E-mail: jimbo@daido-it.ac.jp and Shimizu, T. and Fujiwara, Y.},
abstractNote = {The excellent soft magnetic properties of amorphous (a-) CoFeSiB films make it suited for use in the yoke of granular-in-gap sensors, but only if their thermal stability can be improved. To this end, this study investigated the effects of adding small amounts of other metals on the magnetic and structural properties of a-CoFeSiB films. It was found that adding metals with relatively large atomic radii is an effective way to increase thermal stability, with both Ta and Hf showing good thermal stability after annealing at temperatures of 473 to 573 K. Indeed, a -(CoFeSiB){sub 96.2}Hf{sub 3.8} film was found to maintain its initial coercivity of 0.2 Oe without very little decrease in magnetization after annealing at 623 K. Furthermore, even after annealing at 673 K a -(CoFeSiB){sub 93.0}Hf{sub 7.0} film still had a relatively low coercivity of approximately 0.5 Oe.},
doi = {10.1063/1.4913817},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 17,
volume = 117,
place = {United States},
year = {2015},
month = {5}
}