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Title: An improved multi-exposure approach for high quality holographic femtosecond laser patterning

Abstract

High efficiency two photon polymerization through single exposure via spatial light modulator (SLM) has been used to decrease the fabrication time and rapidly realize various micro/nanostructures, but the surface quality remains a big problem due to the speckle noise of optical intensity distribution at the defocused plane. Here, a multi-exposure approach which used tens of computer generate holograms successively loaded on SLM is presented to significantly improve the optical uniformity without losing efficiency. By applying multi-exposure, we found that the uniformity at the defocused plane was increased from ∼0.02 to ∼0.6 according to our simulation. The fabricated two series of letters “HELLO” and “USTC” under single-and multi-exposure in our experiment also verified that the surface quality was greatly improved. Moreover, by this method, several kinds of beam splitters with high quality, e.g., 2 × 2, 5 × 5 Daman, and complex nonseperate 5 × 5, gratings were fabricated with both of high quality and short time (<1 min, 95% time-saving). This multi-exposure SLM-two-photon polymerization method showed the promising prospect in rapidly fabricating and integrating various binary optical devices and their systems.

Authors:
; ; ; ; ; ; ;  [1]
  1. Department of Precision Machinery and Precision Instrumentation, University of Science and Technology of China, Hefei 230026 (China)
Publication Date:
OSTI Identifier:
22402381
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 105; Journal Issue: 22; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; BEAM OPTICS; EFFICIENCY; HOLOGRAPHY; LASERS; MICROSTRUCTURE; NANOSTRUCTURES; PHOTONS; POLYMERIZATION; SIMULATION

Citation Formats

Zhang, Chenchu, Hu, Yanlei, Li, Jiawen, Lao, Zhaoxin, Ni, Jincheng, Chu, Jiaru, Huang, Wenhao, and Wu, Dong. An improved multi-exposure approach for high quality holographic femtosecond laser patterning. United States: N. p., 2014. Web. doi:10.1063/1.4902925.
Zhang, Chenchu, Hu, Yanlei, Li, Jiawen, Lao, Zhaoxin, Ni, Jincheng, Chu, Jiaru, Huang, Wenhao, & Wu, Dong. An improved multi-exposure approach for high quality holographic femtosecond laser patterning. United States. doi:10.1063/1.4902925.
Zhang, Chenchu, Hu, Yanlei, Li, Jiawen, Lao, Zhaoxin, Ni, Jincheng, Chu, Jiaru, Huang, Wenhao, and Wu, Dong. Mon . "An improved multi-exposure approach for high quality holographic femtosecond laser patterning". United States. doi:10.1063/1.4902925.
@article{osti_22402381,
title = {An improved multi-exposure approach for high quality holographic femtosecond laser patterning},
author = {Zhang, Chenchu and Hu, Yanlei and Li, Jiawen and Lao, Zhaoxin and Ni, Jincheng and Chu, Jiaru and Huang, Wenhao and Wu, Dong},
abstractNote = {High efficiency two photon polymerization through single exposure via spatial light modulator (SLM) has been used to decrease the fabrication time and rapidly realize various micro/nanostructures, but the surface quality remains a big problem due to the speckle noise of optical intensity distribution at the defocused plane. Here, a multi-exposure approach which used tens of computer generate holograms successively loaded on SLM is presented to significantly improve the optical uniformity without losing efficiency. By applying multi-exposure, we found that the uniformity at the defocused plane was increased from ∼0.02 to ∼0.6 according to our simulation. The fabricated two series of letters “HELLO” and “USTC” under single-and multi-exposure in our experiment also verified that the surface quality was greatly improved. Moreover, by this method, several kinds of beam splitters with high quality, e.g., 2 × 2, 5 × 5 Daman, and complex nonseperate 5 × 5, gratings were fabricated with both of high quality and short time (<1 min, 95% time-saving). This multi-exposure SLM-two-photon polymerization method showed the promising prospect in rapidly fabricating and integrating various binary optical devices and their systems.},
doi = {10.1063/1.4902925},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 22,
volume = 105,
place = {United States},
year = {2014},
month = {12}
}