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Title: Low temperature (150 °C) fabrication of high-performance TiO{sub 2} films for dye-sensitized solar cells using ultraviolet light and plasma treatments of TiO{sub 2} paste containing organic binder

Abstract

Dye-sensitized solar cells (DSSCs) require annealing of TiO{sub 2} photoelectrodes at 450 °C to 550 °C. However, such high-temperature annealing is unfavorable because it limits the use of materials that cannot withstand high temperatures, such as plastic substrates. In our previous paper, a low-temperature annealing technique of TiO{sub 2} photoelectrodes using ultraviolet light and dielectric barrier discharge treatments was proposed to reduce the annealing temperature from 450 °C to 150 °C for a TiO{sub 2} paste containing an organic binder. Here, we measure the electron diffusion length in the TiO{sub 2} film, the amount of dye adsorption on the TiO{sub 2} film, and the sheet resistance of a glass substrate of samples manufactured with the 150 °C annealing method, and we discuss the effect that the 150 °C annealing method has on those properties of DSSCs.

Authors:
;  [1];  [2]
  1. Department of Advanced Energy, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 227-8568 (Japan)
  2. Department of Electrical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan)
Publication Date:
OSTI Identifier:
22399246
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 117; Journal Issue: 10; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ADSORPTION; ANNEALING; DIELECTRIC MATERIALS; DIFFUSION LENGTH; ELECTRONS; FABRICATION; GLASS; PERFORMANCE; PLASTICS; SOLAR CELLS; SUBSTRATES; TEMPERATURE DEPENDENCE; THIN FILMS; TITANIUM OXIDES; ULTRAVIOLET RADIATION; VISIBLE RADIATION

Citation Formats

Zen, Shungo, E-mail: zen@streamer.t.u-tokyo.ac.jp, Ono, Ryo, E-mail: ryo-ono@k.u-tokyo.ac.jp, and Inoue, Yuki. Low temperature (150 °C) fabrication of high-performance TiO{sub 2} films for dye-sensitized solar cells using ultraviolet light and plasma treatments of TiO{sub 2} paste containing organic binder. United States: N. p., 2015. Web. doi:10.1063/1.4914873.
Zen, Shungo, E-mail: zen@streamer.t.u-tokyo.ac.jp, Ono, Ryo, E-mail: ryo-ono@k.u-tokyo.ac.jp, & Inoue, Yuki. Low temperature (150 °C) fabrication of high-performance TiO{sub 2} films for dye-sensitized solar cells using ultraviolet light and plasma treatments of TiO{sub 2} paste containing organic binder. United States. doi:10.1063/1.4914873.
Zen, Shungo, E-mail: zen@streamer.t.u-tokyo.ac.jp, Ono, Ryo, E-mail: ryo-ono@k.u-tokyo.ac.jp, and Inoue, Yuki. Sat . "Low temperature (150 °C) fabrication of high-performance TiO{sub 2} films for dye-sensitized solar cells using ultraviolet light and plasma treatments of TiO{sub 2} paste containing organic binder". United States. doi:10.1063/1.4914873.
@article{osti_22399246,
title = {Low temperature (150 °C) fabrication of high-performance TiO{sub 2} films for dye-sensitized solar cells using ultraviolet light and plasma treatments of TiO{sub 2} paste containing organic binder},
author = {Zen, Shungo, E-mail: zen@streamer.t.u-tokyo.ac.jp and Ono, Ryo, E-mail: ryo-ono@k.u-tokyo.ac.jp and Inoue, Yuki},
abstractNote = {Dye-sensitized solar cells (DSSCs) require annealing of TiO{sub 2} photoelectrodes at 450 °C to 550 °C. However, such high-temperature annealing is unfavorable because it limits the use of materials that cannot withstand high temperatures, such as plastic substrates. In our previous paper, a low-temperature annealing technique of TiO{sub 2} photoelectrodes using ultraviolet light and dielectric barrier discharge treatments was proposed to reduce the annealing temperature from 450 °C to 150 °C for a TiO{sub 2} paste containing an organic binder. Here, we measure the electron diffusion length in the TiO{sub 2} film, the amount of dye adsorption on the TiO{sub 2} film, and the sheet resistance of a glass substrate of samples manufactured with the 150 °C annealing method, and we discuss the effect that the 150 °C annealing method has on those properties of DSSCs.},
doi = {10.1063/1.4914873},
journal = {Journal of Applied Physics},
number = 10,
volume = 117,
place = {United States},
year = {Sat Mar 14 00:00:00 EDT 2015},
month = {Sat Mar 14 00:00:00 EDT 2015}
}