Low temperature (150 °C) fabrication of high-performance TiO{sub 2} films for dye-sensitized solar cells using ultraviolet light and plasma treatments of TiO{sub 2} paste containing organic binder
- Department of Advanced Energy, The University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa, Chiba 227-8568 (Japan)
- Department of Electrical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656 (Japan)
Dye-sensitized solar cells (DSSCs) require annealing of TiO{sub 2} photoelectrodes at 450 °C to 550 °C. However, such high-temperature annealing is unfavorable because it limits the use of materials that cannot withstand high temperatures, such as plastic substrates. In our previous paper, a low-temperature annealing technique of TiO{sub 2} photoelectrodes using ultraviolet light and dielectric barrier discharge treatments was proposed to reduce the annealing temperature from 450 °C to 150 °C for a TiO{sub 2} paste containing an organic binder. Here, we measure the electron diffusion length in the TiO{sub 2} film, the amount of dye adsorption on the TiO{sub 2} film, and the sheet resistance of a glass substrate of samples manufactured with the 150 °C annealing method, and we discuss the effect that the 150 °C annealing method has on those properties of DSSCs.
- OSTI ID:
- 22399246
- Journal Information:
- Journal of Applied Physics, Vol. 117, Issue 10; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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