skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines

Abstract

In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit designed for in situ experiments using synchrotron radiation facilities. The chamber can be mounted at various synchrotron beamlines for scattering experiments in grazing incidence geometry. The sample position and the large exit window allow to perform x-ray experiments up to large q values. The sputtering unit is easy to mount on existing experimental setups and can be remote-controlled. In this paper, we describe in detail the design and the performance of the new sputtering chamber and present the installation of the apparatus at different 3rd generation light sources. Furthermore, we describe the different measurement options and present some selected results. The unit has been successfully commissioned and is now available for users at PETRA III at DESY.

Authors:
 [1];  [2];  [1];  [3]; ; ;  [1];  [4];  [5]
  1. Deutsches Elektronen-Synchrotron, Notkestr. 85, D-22607 Hamburg (Germany)
  2. (Germany)
  3. (Denmark)
  4. Institut für Werkstoffe der Elektrotechnik II (IWE II) and JARA-FIT, RWTH Aachen University, Sommerfeldstr. 24, D-52074 Aachen (Germany)
  5. 2nd. Institute of Physics B and JARA-FIT, RWTH Aachen University, Otto-Blumenthal-Str. 1, D-52074 Aachen (Germany)
Publication Date:
OSTI Identifier:
22392503
Resource Type:
Journal Article
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 86; Journal Issue: 5; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0034-6748
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; DESIGN; DESY; GEOMETRY; PERFORMANCE; SPUTTERING; SYNCHROTRON RADIATION; THIN FILMS; X RADIATION

Citation Formats

Walter, P., E-mail: peter.walter@desy.de, 2nd. Institute of Physics B and JARA-FIT, RWTH Aachen University, Otto-Blumenthal-Str. 1, D-52074 Aachen, Dippel, A.-C., Center for Materials Crystallography, Department of Chemistry, Aarhus University, Langelandsgade 140, 8000 Aarhus C, Pflaum, K., Wernecke, J., Blume, J., Hurk, J. van den, and Klemradt, U. A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines. United States: N. p., 2015. Web. doi:10.1063/1.4918620.
Walter, P., E-mail: peter.walter@desy.de, 2nd. Institute of Physics B and JARA-FIT, RWTH Aachen University, Otto-Blumenthal-Str. 1, D-52074 Aachen, Dippel, A.-C., Center for Materials Crystallography, Department of Chemistry, Aarhus University, Langelandsgade 140, 8000 Aarhus C, Pflaum, K., Wernecke, J., Blume, J., Hurk, J. van den, & Klemradt, U. A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines. United States. doi:10.1063/1.4918620.
Walter, P., E-mail: peter.walter@desy.de, 2nd. Institute of Physics B and JARA-FIT, RWTH Aachen University, Otto-Blumenthal-Str. 1, D-52074 Aachen, Dippel, A.-C., Center for Materials Crystallography, Department of Chemistry, Aarhus University, Langelandsgade 140, 8000 Aarhus C, Pflaum, K., Wernecke, J., Blume, J., Hurk, J. van den, and Klemradt, U. Fri . "A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines". United States. doi:10.1063/1.4918620.
@article{osti_22392503,
title = {A compact and low-weight sputtering unit for in situ investigations of thin film growth at synchrotron radiation beamlines},
author = {Walter, P., E-mail: peter.walter@desy.de and 2nd. Institute of Physics B and JARA-FIT, RWTH Aachen University, Otto-Blumenthal-Str. 1, D-52074 Aachen and Dippel, A.-C. and Center for Materials Crystallography, Department of Chemistry, Aarhus University, Langelandsgade 140, 8000 Aarhus C and Pflaum, K. and Wernecke, J. and Blume, J. and Hurk, J. van den and Klemradt, U.},
abstractNote = {In this work, we report on a highly variable, compact, and light high-vacuum sputter deposition unit designed for in situ experiments using synchrotron radiation facilities. The chamber can be mounted at various synchrotron beamlines for scattering experiments in grazing incidence geometry. The sample position and the large exit window allow to perform x-ray experiments up to large q values. The sputtering unit is easy to mount on existing experimental setups and can be remote-controlled. In this paper, we describe in detail the design and the performance of the new sputtering chamber and present the installation of the apparatus at different 3rd generation light sources. Furthermore, we describe the different measurement options and present some selected results. The unit has been successfully commissioned and is now available for users at PETRA III at DESY.},
doi = {10.1063/1.4918620},
journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 5,
volume = 86,
place = {United States},
year = {2015},
month = {5}
}