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Title: Note: A stand on the basis of atomic force microscope to study substrates for imaging optics

Abstract

A description of a stand based on atomic force microscopy (AFM) for roughness measurements of large optical components with arbitrary surfaces is given. The sample under study is mounted on a uniaxial goniometer which allows the sample to be tilted in the range of ±30°. The inclination enables the local normal along the axis of the probe to be established at any point of the surface under study. A comparison of the results of the measurement of noise and roughness of a flat quartz sample, in the range of spatial frequencies 0.025–70 μm{sup −1}, obtained from “standard” AFM and developed versions is given. Within the experimental error, the measurement results were equivalent. Examples of applications of the stand for the study of substrates for X-ray optics are presented.

Authors:
; ;  [1]
  1. Department of Multilayer Optics, Institute for Physics of Microstructures of the Russian Academy of Sciences, GSP-105, 603950 Nizhny Novgorod (Russian Federation)
Publication Date:
OSTI Identifier:
22392336
Resource Type:
Journal Article
Resource Relation:
Journal Name: Review of Scientific Instruments; Journal Volume: 86; Journal Issue: 1; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; ATOMIC FORCE MICROSCOPY; ERRORS; GONIOMETERS; INCLINATION; NOISE; OPTICS; PROBES; QUARTZ; ROUGHNESS; SUBSTRATES; SURFACES; X RADIATION

Citation Formats

Chkhalo, N. I., Salashchenko, N. N., and Zorina, M. V. Note: A stand on the basis of atomic force microscope to study substrates for imaging optics. United States: N. p., 2015. Web. doi:10.1063/1.4905336.
Chkhalo, N. I., Salashchenko, N. N., & Zorina, M. V. Note: A stand on the basis of atomic force microscope to study substrates for imaging optics. United States. doi:10.1063/1.4905336.
Chkhalo, N. I., Salashchenko, N. N., and Zorina, M. V. Thu . "Note: A stand on the basis of atomic force microscope to study substrates for imaging optics". United States. doi:10.1063/1.4905336.
@article{osti_22392336,
title = {Note: A stand on the basis of atomic force microscope to study substrates for imaging optics},
author = {Chkhalo, N. I. and Salashchenko, N. N. and Zorina, M. V.},
abstractNote = {A description of a stand based on atomic force microscopy (AFM) for roughness measurements of large optical components with arbitrary surfaces is given. The sample under study is mounted on a uniaxial goniometer which allows the sample to be tilted in the range of ±30°. The inclination enables the local normal along the axis of the probe to be established at any point of the surface under study. A comparison of the results of the measurement of noise and roughness of a flat quartz sample, in the range of spatial frequencies 0.025–70 μm{sup −1}, obtained from “standard” AFM and developed versions is given. Within the experimental error, the measurement results were equivalent. Examples of applications of the stand for the study of substrates for X-ray optics are presented.},
doi = {10.1063/1.4905336},
journal = {Review of Scientific Instruments},
number = 1,
volume = 86,
place = {United States},
year = {Thu Jan 15 00:00:00 EST 2015},
month = {Thu Jan 15 00:00:00 EST 2015}
}