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Title: Composition and work function relationship in Os–Ru–W ternary alloys

Abstract

Os–Ru thin films with varying concentrations of W were sputter deposited in order to investigate their structure–property relationships. The films were analyzed with x-ray diffraction to investigate their crystal structures, and a Kelvin probe to investigate their work functions. An Os–Ru–W film with ∼30 at. % W yielded a work function maximum of approximately 5.38 eV. These results align well with other studies that found work function minima from thermionic emission data on M-type cathodes with varying amounts of W in the coatings. Furthermore, the results are consistent with other work explaining energy-level alignment and charge transfer of molecules on metal oxides. This may shed light on the mechanism behind the “anomalous effect” first reported by Zalm et al., whereby a high work function coating results in a low work function for emitting cathode surfaces. An important implication of this work is the potential for the Kelvin probe to evaluate the effectiveness of dispenser cathode coatings.

Authors:
; ;  [1]
  1. Department of Chemical and Materials Engineering, University of Kentucky, 177 F. Paul Anderson Tower, Lexington, Kentucky 40506-0046 (United States)
Publication Date:
OSTI Identifier:
22392148
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 2; Other Information: (c) 2015 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CATHODES; COATINGS; CRYSTAL STRUCTURE; ENERGY LEVELS; METALS; SPUTTERING; TERNARY ALLOY SYSTEMS; THERMIONIC EMISSION; THIN FILMS; WORK FUNCTIONS; X-RAY DIFFRACTION

Citation Formats

Swartzentruber, Phillip D., Detisch, Michael J., and Balk, T. John, E-mail: john.balk@uky.edu. Composition and work function relationship in Os–Ru–W ternary alloys. United States: N. p., 2015. Web. doi:10.1116/1.4905499.
Swartzentruber, Phillip D., Detisch, Michael J., & Balk, T. John, E-mail: john.balk@uky.edu. Composition and work function relationship in Os–Ru–W ternary alloys. United States. doi:10.1116/1.4905499.
Swartzentruber, Phillip D., Detisch, Michael J., and Balk, T. John, E-mail: john.balk@uky.edu. Sun . "Composition and work function relationship in Os–Ru–W ternary alloys". United States. doi:10.1116/1.4905499.
@article{osti_22392148,
title = {Composition and work function relationship in Os–Ru–W ternary alloys},
author = {Swartzentruber, Phillip D. and Detisch, Michael J. and Balk, T. John, E-mail: john.balk@uky.edu},
abstractNote = {Os–Ru thin films with varying concentrations of W were sputter deposited in order to investigate their structure–property relationships. The films were analyzed with x-ray diffraction to investigate their crystal structures, and a Kelvin probe to investigate their work functions. An Os–Ru–W film with ∼30 at. % W yielded a work function maximum of approximately 5.38 eV. These results align well with other studies that found work function minima from thermionic emission data on M-type cathodes with varying amounts of W in the coatings. Furthermore, the results are consistent with other work explaining energy-level alignment and charge transfer of molecules on metal oxides. This may shed light on the mechanism behind the “anomalous effect” first reported by Zalm et al., whereby a high work function coating results in a low work function for emitting cathode surfaces. An important implication of this work is the potential for the Kelvin probe to evaluate the effectiveness of dispenser cathode coatings.},
doi = {10.1116/1.4905499},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 2,
volume = 33,
place = {United States},
year = {Sun Mar 15 00:00:00 EDT 2015},
month = {Sun Mar 15 00:00:00 EDT 2015}
}