Surface structure and surface kinetics of InN grown by plasma-assisted atomic layer epitaxy: A HREELS study

Journal Article · Sun Mar 15 00:00:00 EDT 2015 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.4901873· OSTI ID:22392144

Thoms, Brian D. ^[1]; Nepal, Neeraj ^[2]; Eddy, Charles R. ^[3]

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1. Department of Physics and Astronomy, Georgia State University, Atlanta, Georgia 30303 (United States)
2. American Association for Engineering Education, 1818 N Street NW, Washington, DC 20034 (United States)
3. Electronics Science and Technology Division, U.S. Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375 (United States)

The surface bonding configuration and kinetics of hydrogen desorption from InN grown by plasma-assisted atomic layer epitaxy have been investigated. High resolution electron energy loss spectra exhibited loss peaks assigned to a Fuchs–Kliewer surface phonon, N-N and N-H surface species. The surface N-N vibrations are attributed to surface defects. The observation of N-H but no In-H surface species suggested N-terminated InN. Isothermal desorption data were best fit by the first-order desorption kinetics with an activation energy of (0.88 ± 0.06) eV and pre-exponential factor of (1.5 ± 0.5) × 10{sup 5 }s{sup −1}.

• OSTI ID: 22392144
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 33, Issue 2; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0734-2101
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
42 ENGINEERING
ACTIVATION ENERGY
BONDING
DESORPTION
ELECTRONS
ENERGY-LOSS SPECTROSCOPY
EPITAXY
INDIUM NITRIDES
KINETICS
LAYERS
PLASMA
SURFACES