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Title: Undoped TiO{sub 2} and nitrogen-doped TiO{sub 2} thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications

Abstract

Undoped and nitrogen doped TiO{sub 2} thin films were deposited by atomic layer deposition on planar substrates. Deposition on 3D-architecture substrates made of metallic foams was also investigated to propose architectured photovoltaic stack fabrication. All the films were deposited at 265 °C and nitrogen incorporation was achieved by using titanium isopropoxide, NH{sub 3} and/or N{sub 2}O as precursors. The maximum nitrogen incorporation level obtained in this study was 2.9 at. %, resulting in films exhibiting a resistivity of 115 Ω cm (+/−10 Ω cm) combined with an average total transmittance of 60% in the 400–1000 nm wavelength range. Eventually, TiO{sub 2} thin films were deposited on the 3D metallic foam template.

Authors:
; ; ; ; ; ; ; ; ; ;  [1]; ;  [2]
  1. SIMaP Laboratory - CNRS, Univ. Grenoble Alpes, F-38000 Grenoble (France)
  2. LMGP Laboratory - CNRS, Univ. Grenoble Alpes, F-38000 Grenoble (France)
Publication Date:
OSTI Identifier:
22392114
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films; Journal Volume: 33; Journal Issue: 1; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 42 ENGINEERING; AMMONIA; DEPOSITION; DEPOSITS; DOPED MATERIALS; FABRICATION; FOAMS; NITROGEN; NITROUS OXIDE; PHOTOVOLTAIC EFFECT; SUBSTRATES; SURFACES; THIN FILMS; TITANIUM OXIDES; WAVELENGTHS

Citation Formats

Tian, Liang, E-mail: liang.tian9@gmail.com, Soum-Glaude, Adurey, Volpi, Fabien, Salvo, Luc, Berthomé, Grégory, Coindeau, Stéphane, Mantoux, Arnaud, Boichot, Raphaël, Lay, Sabine, Brizé, Virginie, Blanquet, Elisabeth, Giusti, Gaël, and Bellet, Daniel. Undoped TiO{sub 2} and nitrogen-doped TiO{sub 2} thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications. United States: N. p., 2015. Web. doi:10.1116/1.4904025.
Tian, Liang, E-mail: liang.tian9@gmail.com, Soum-Glaude, Adurey, Volpi, Fabien, Salvo, Luc, Berthomé, Grégory, Coindeau, Stéphane, Mantoux, Arnaud, Boichot, Raphaël, Lay, Sabine, Brizé, Virginie, Blanquet, Elisabeth, Giusti, Gaël, & Bellet, Daniel. Undoped TiO{sub 2} and nitrogen-doped TiO{sub 2} thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications. United States. doi:10.1116/1.4904025.
Tian, Liang, E-mail: liang.tian9@gmail.com, Soum-Glaude, Adurey, Volpi, Fabien, Salvo, Luc, Berthomé, Grégory, Coindeau, Stéphane, Mantoux, Arnaud, Boichot, Raphaël, Lay, Sabine, Brizé, Virginie, Blanquet, Elisabeth, Giusti, Gaël, and Bellet, Daniel. Thu . "Undoped TiO{sub 2} and nitrogen-doped TiO{sub 2} thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications". United States. doi:10.1116/1.4904025.
@article{osti_22392114,
title = {Undoped TiO{sub 2} and nitrogen-doped TiO{sub 2} thin films deposited by atomic layer deposition on planar and architectured surfaces for photovoltaic applications},
author = {Tian, Liang, E-mail: liang.tian9@gmail.com and Soum-Glaude, Adurey and Volpi, Fabien and Salvo, Luc and Berthomé, Grégory and Coindeau, Stéphane and Mantoux, Arnaud and Boichot, Raphaël and Lay, Sabine and Brizé, Virginie and Blanquet, Elisabeth and Giusti, Gaël and Bellet, Daniel},
abstractNote = {Undoped and nitrogen doped TiO{sub 2} thin films were deposited by atomic layer deposition on planar substrates. Deposition on 3D-architecture substrates made of metallic foams was also investigated to propose architectured photovoltaic stack fabrication. All the films were deposited at 265 °C and nitrogen incorporation was achieved by using titanium isopropoxide, NH{sub 3} and/or N{sub 2}O as precursors. The maximum nitrogen incorporation level obtained in this study was 2.9 at. %, resulting in films exhibiting a resistivity of 115 Ω cm (+/−10 Ω cm) combined with an average total transmittance of 60% in the 400–1000 nm wavelength range. Eventually, TiO{sub 2} thin films were deposited on the 3D metallic foam template.},
doi = {10.1116/1.4904025},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 1,
volume = 33,
place = {United States},
year = {Thu Jan 15 00:00:00 EST 2015},
month = {Thu Jan 15 00:00:00 EST 2015}
}