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Title: Effect of rapid thermal annealing temperature on the dispersion of Si nanocrystals in SiO{sub 2} matrix

Abstract

Effect of rapid thermal annealing temperature on the dispersion of silicon nanocrystals (Si-NC’s) embedded in SiO{sub 2} matrix grown by atom beam sputtering (ABS) method is reported. The dispersion of Si NCs in SiO{sub 2} is an important issue to fabricate high efficiency devices based on Si-NC’s. The transmission electron microscopy studies reveal that the precipitation of excess silicon is almost uniform and the particles grow in almost uniform size upto 850 °C. The size distribution of the particles broadens and becomes bimodal as the temperature is increased to 950 °C. This suggests that by controlling the annealing temperature, the dispersion of Si-NC’s can be controlled. The results are supported by selected area diffraction (SAED) studies and micro photoluminescence (PL) spectroscopy. The discussion of effect of particle size distribution on PL spectrum is presented based on tight binding approximation (TBA) method using Gaussian and log-normal distribution of particles. The study suggests that the dispersion and consequently emission energy varies as a function of particle size distribution and that can be controlled by annealing parameters.

Authors:
; ;  [1]
  1. Department of Physics and Astrophysics, University of Delhi, Delhi-110007 (India)
Publication Date:
OSTI Identifier:
22391736
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1661; Journal Issue: 1; Conference: ICCMP 2014: International Conference on Condensed Matter Physics 2014, Shimla (India), 4-6 Nov 2014; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; 77 NANOSCIENCE AND NANOTECHNOLOGY; ANNEALING; APPROXIMATIONS; ELECTRON DIFFRACTION; EMISSION SPECTROSCOPY; MATRIX MATERIALS; NANOSTRUCTURES; PARTICLE SIZE; PARTICLES; PHOTOLUMINESCENCE; PRECIPITATION; SILICON; SILICON OXIDES; SPUTTERING; TEMPERATURE DEPENDENCE; TRANSMISSION ELECTRON MICROSCOPY

Citation Formats

Saxena, Nupur, E-mail: n1saxena@gmail.com, Kumar, Pragati, and Gupta, Vinay. Effect of rapid thermal annealing temperature on the dispersion of Si nanocrystals in SiO{sub 2} matrix. United States: N. p., 2015. Web. doi:10.1063/1.4915417.
Saxena, Nupur, E-mail: n1saxena@gmail.com, Kumar, Pragati, & Gupta, Vinay. Effect of rapid thermal annealing temperature on the dispersion of Si nanocrystals in SiO{sub 2} matrix. United States. doi:10.1063/1.4915417.
Saxena, Nupur, E-mail: n1saxena@gmail.com, Kumar, Pragati, and Gupta, Vinay. Fri . "Effect of rapid thermal annealing temperature on the dispersion of Si nanocrystals in SiO{sub 2} matrix". United States. doi:10.1063/1.4915417.
@article{osti_22391736,
title = {Effect of rapid thermal annealing temperature on the dispersion of Si nanocrystals in SiO{sub 2} matrix},
author = {Saxena, Nupur, E-mail: n1saxena@gmail.com and Kumar, Pragati and Gupta, Vinay},
abstractNote = {Effect of rapid thermal annealing temperature on the dispersion of silicon nanocrystals (Si-NC’s) embedded in SiO{sub 2} matrix grown by atom beam sputtering (ABS) method is reported. The dispersion of Si NCs in SiO{sub 2} is an important issue to fabricate high efficiency devices based on Si-NC’s. The transmission electron microscopy studies reveal that the precipitation of excess silicon is almost uniform and the particles grow in almost uniform size upto 850 °C. The size distribution of the particles broadens and becomes bimodal as the temperature is increased to 950 °C. This suggests that by controlling the annealing temperature, the dispersion of Si-NC’s can be controlled. The results are supported by selected area diffraction (SAED) studies and micro photoluminescence (PL) spectroscopy. The discussion of effect of particle size distribution on PL spectrum is presented based on tight binding approximation (TBA) method using Gaussian and log-normal distribution of particles. The study suggests that the dispersion and consequently emission energy varies as a function of particle size distribution and that can be controlled by annealing parameters.},
doi = {10.1063/1.4915417},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1661,
place = {United States},
year = {2015},
month = {5}
}