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Title: Understanding and engineering of NiGe/Ge junction formed by phosphorus ion implantation after germanidation

Abstract

Modulation of the effective electron Schottky barrier height (eSBH) of NiGe/Ge contacts induced by phosphorus ion implantation after germanide formation was investigated by considering local inhomogeneity in the eSBH. Systematic studies of NiGe/Ge contact devices having various germanide thicknesses and ion implantation areas indicated the threshold dopant concentration at the NiGe/Ge interface required for eSBH modulation and negligible dopant diffusion even at NiGe/Ge interface during drive-in annealing, leading to variation in the eSBH between the bottom and sidewall portions of the NiGe regions. Consequently, this method makes it possible to design source/drain contacts with low-resistivity Ohmic and ideal rectifying characteristics for future Ge-based transistors.

Authors:
; ; ; ;  [1]
  1. Department of Material and Life Science, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871 (Japan)
Publication Date:
OSTI Identifier:
22320366
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 105; Journal Issue: 6; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CONNECTORS; DOPED MATERIALS; ELECTRIC CONTACTS; ENGINEERING; GERMANIUM; GERMANIUM COMPOUNDS; ION IMPLANTATION; NICKEL COMPOUNDS; PHOSPHORUS; SCHOTTKY EFFECT; SEMICONDUCTOR JUNCTIONS; SEMICONDUCTOR MATERIALS

Citation Formats

Oka, Hiroshi, E-mail: oka@asf.mls.eng.osaka-u.ac.jp, Minoura, Yuya, Hosoi, Takuji, Shimura, Takayoshi, and Watanabe, Heiji. Understanding and engineering of NiGe/Ge junction formed by phosphorus ion implantation after germanidation. United States: N. p., 2014. Web. doi:10.1063/1.4893152.
Oka, Hiroshi, E-mail: oka@asf.mls.eng.osaka-u.ac.jp, Minoura, Yuya, Hosoi, Takuji, Shimura, Takayoshi, & Watanabe, Heiji. Understanding and engineering of NiGe/Ge junction formed by phosphorus ion implantation after germanidation. United States. doi:10.1063/1.4893152.
Oka, Hiroshi, E-mail: oka@asf.mls.eng.osaka-u.ac.jp, Minoura, Yuya, Hosoi, Takuji, Shimura, Takayoshi, and Watanabe, Heiji. Mon . "Understanding and engineering of NiGe/Ge junction formed by phosphorus ion implantation after germanidation". United States. doi:10.1063/1.4893152.
@article{osti_22320366,
title = {Understanding and engineering of NiGe/Ge junction formed by phosphorus ion implantation after germanidation},
author = {Oka, Hiroshi, E-mail: oka@asf.mls.eng.osaka-u.ac.jp and Minoura, Yuya and Hosoi, Takuji and Shimura, Takayoshi and Watanabe, Heiji},
abstractNote = {Modulation of the effective electron Schottky barrier height (eSBH) of NiGe/Ge contacts induced by phosphorus ion implantation after germanide formation was investigated by considering local inhomogeneity in the eSBH. Systematic studies of NiGe/Ge contact devices having various germanide thicknesses and ion implantation areas indicated the threshold dopant concentration at the NiGe/Ge interface required for eSBH modulation and negligible dopant diffusion even at NiGe/Ge interface during drive-in annealing, leading to variation in the eSBH between the bottom and sidewall portions of the NiGe regions. Consequently, this method makes it possible to design source/drain contacts with low-resistivity Ohmic and ideal rectifying characteristics for future Ge-based transistors.},
doi = {10.1063/1.4893152},
journal = {Applied Physics Letters},
number = 6,
volume = 105,
place = {United States},
year = {Mon Aug 11 00:00:00 EDT 2014},
month = {Mon Aug 11 00:00:00 EDT 2014}
}