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Title: Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si

Abstract

Thin films of Co and Co/Cu/Co trilayers with wedged Cu interlayers were grown epitaxially on Cu buffer layers on hydrogen passivated Si(001) wafers. We find that single Co layers have a well-defined four-fold anisotropy but with smaller in-plane anisotropies than observed in Co grown on Cu crystals. Ruderman–Kittel–Kasuya–Yosida (RKKY) interlayer coupling is observed in one Co/Cu/Co sample which is the smoothest of the films as measured by atomic force microscopy. Some of the films also form a dot-like structure on the surface. Intermixing at elevated temperatures between the Cu buffer and Si limits the ability to form flat surfaces to promote RKKY coupling.

Authors:
; ; ; ; ;  [1]
  1. Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue, Cambridge CB3 0HE (United Kingdom)
Publication Date:
OSTI Identifier:
22314614
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 116; Journal Issue: 6; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ANISOTROPY; ATOMIC FORCE MICROSCOPY; CRYSTALS; EPITAXY; HYDROGEN; LAYERS; MAGNETIC PROPERTIES; SURFACES; THIN FILMS

Citation Formats

Mansell, R., Petit, D. C. M. C., Fernández-Pacheco, A., Lavrijsen, R., Lee, J. H., and Cowburn, R. P. Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si. United States: N. p., 2014. Web. doi:10.1063/1.4893306.
Mansell, R., Petit, D. C. M. C., Fernández-Pacheco, A., Lavrijsen, R., Lee, J. H., & Cowburn, R. P. Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si. United States. doi:10.1063/1.4893306.
Mansell, R., Petit, D. C. M. C., Fernández-Pacheco, A., Lavrijsen, R., Lee, J. H., and Cowburn, R. P. Thu . "Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si". United States. doi:10.1063/1.4893306.
@article{osti_22314614,
title = {Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si},
author = {Mansell, R. and Petit, D. C. M. C. and Fernández-Pacheco, A. and Lavrijsen, R. and Lee, J. H. and Cowburn, R. P.},
abstractNote = {Thin films of Co and Co/Cu/Co trilayers with wedged Cu interlayers were grown epitaxially on Cu buffer layers on hydrogen passivated Si(001) wafers. We find that single Co layers have a well-defined four-fold anisotropy but with smaller in-plane anisotropies than observed in Co grown on Cu crystals. Ruderman–Kittel–Kasuya–Yosida (RKKY) interlayer coupling is observed in one Co/Cu/Co sample which is the smoothest of the films as measured by atomic force microscopy. Some of the films also form a dot-like structure on the surface. Intermixing at elevated temperatures between the Cu buffer and Si limits the ability to form flat surfaces to promote RKKY coupling.},
doi = {10.1063/1.4893306},
journal = {Journal of Applied Physics},
number = 6,
volume = 116,
place = {United States},
year = {Thu Aug 14 00:00:00 EDT 2014},
month = {Thu Aug 14 00:00:00 EDT 2014}
}