Large-scale fabrication of BN tunnel barriers for graphene spintronics
Abstract
We have fabricated graphene spin-valve devices utilizing scalable materials made from chemical vapor deposition (CVD). Both the spin-transporting graphene and the tunnel barrier material are CVD-grown. The tunnel barrier is realized by Hexagonal boron nitride, used either as a monolayer or bilayer and placed over the graphene. Spin transport experiments were performed using ferromagnetic contacts deposited onto the barrier. We find that spin injection is still greatly suppressed in devices with a monolayer tunneling barrier due to resistance mismatch. This is, however, not the case for devices with bilayer barriers. For those devices, a spin relaxation time of ∼260 ps intrinsic to the CVD graphene material is deduced. This time scale is comparable to those reported for exfoliated graphene, suggesting that this CVD approach is promising for spintronic applications which require scalable materials.
- Authors:
-
- Department of Physics, University of Basel, Basel (Switzerland)
- Publication Date:
- OSTI Identifier:
- 22314306
- Resource Type:
- Journal Article
- Journal Name:
- Journal of Applied Physics
- Additional Journal Information:
- Journal Volume: 116; Journal Issue: 7; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; BORON NITRIDES; CHEMICAL VAPOR DEPOSITION; DEPOSITS; FABRICATION; GRAPHENE; LAYERS; MATERIALS; RELAXATION TIME; SPIN; TUNNEL EFFECT
Citation Formats
Fu, Wangyang, Makk, Péter, Maurand, Romain, Bräuninger, Matthias, and Schönenberger, Christian. Large-scale fabrication of BN tunnel barriers for graphene spintronics. United States: N. p., 2014.
Web. doi:10.1063/1.4893578.
Fu, Wangyang, Makk, Péter, Maurand, Romain, Bräuninger, Matthias, & Schönenberger, Christian. Large-scale fabrication of BN tunnel barriers for graphene spintronics. United States. https://doi.org/10.1063/1.4893578
Fu, Wangyang, Makk, Péter, Maurand, Romain, Bräuninger, Matthias, and Schönenberger, Christian. Thu .
"Large-scale fabrication of BN tunnel barriers for graphene spintronics". United States. https://doi.org/10.1063/1.4893578.
@article{osti_22314306,
title = {Large-scale fabrication of BN tunnel barriers for graphene spintronics},
author = {Fu, Wangyang and Makk, Péter and Maurand, Romain and Bräuninger, Matthias and Schönenberger, Christian},
abstractNote = {We have fabricated graphene spin-valve devices utilizing scalable materials made from chemical vapor deposition (CVD). Both the spin-transporting graphene and the tunnel barrier material are CVD-grown. The tunnel barrier is realized by Hexagonal boron nitride, used either as a monolayer or bilayer and placed over the graphene. Spin transport experiments were performed using ferromagnetic contacts deposited onto the barrier. We find that spin injection is still greatly suppressed in devices with a monolayer tunneling barrier due to resistance mismatch. This is, however, not the case for devices with bilayer barriers. For those devices, a spin relaxation time of ∼260 ps intrinsic to the CVD graphene material is deduced. This time scale is comparable to those reported for exfoliated graphene, suggesting that this CVD approach is promising for spintronic applications which require scalable materials.},
doi = {10.1063/1.4893578},
url = {https://www.osti.gov/biblio/22314306},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 7,
volume = 116,
place = {United States},
year = {2014},
month = {8}
}