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Title: On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes

Abstract

In this study, we attempted to determine the possibility of multiple inductively coupled plasma (ICP) and helicon plasma sources for large-area processes. Experiments were performed with the one and two coils to measure plasma and electrical parameters, and a circuit simulation was performed to measure the current at each coil in the 2-coil experiment. Based on the result, we could determine the possibility of multiple ICP sources due to a direct change of impedance due to current and saturation of impedance due to the skin-depth effect. However, a helicon plasma source is difficult to adapt to the multiple sources due to the consistent change of real impedance due to mode transition and the low uniformity of the B-field confinement. As a result, it is expected that ICP can be adapted to multiple sources for large-area processes.

Authors:
; ;  [1];  [2]
  1. Low-temperature Plasma Laboratory, Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 305-701 (Korea, Republic of)
  2. Agency of Defense Development, Yuseong-gu, Daejeon 305-151 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22303802
Resource Type:
Journal Article
Resource Relation:
Journal Name: Physics of Plasmas; Journal Volume: 21; Journal Issue: 8; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; CONFINEMENT; CURRENTS; DEPTH; IMPEDANCE; PLASMA; SATURATION; SIMULATION

Citation Formats

Lee, Jin-Won, Lee, Yun-Seong, E-mail: leeeeys@kaist.ac.kr, Chang, Hong-Young, and An, Sang-Hyuk. On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes. United States: N. p., 2014. Web. doi:10.1063/1.4892170.
Lee, Jin-Won, Lee, Yun-Seong, E-mail: leeeeys@kaist.ac.kr, Chang, Hong-Young, & An, Sang-Hyuk. On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes. United States. doi:10.1063/1.4892170.
Lee, Jin-Won, Lee, Yun-Seong, E-mail: leeeeys@kaist.ac.kr, Chang, Hong-Young, and An, Sang-Hyuk. Fri . "On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes". United States. doi:10.1063/1.4892170.
@article{osti_22303802,
title = {On the possibility of the multiple inductively coupled plasma and helicon plasma sources for large-area processes},
author = {Lee, Jin-Won and Lee, Yun-Seong, E-mail: leeeeys@kaist.ac.kr and Chang, Hong-Young and An, Sang-Hyuk},
abstractNote = {In this study, we attempted to determine the possibility of multiple inductively coupled plasma (ICP) and helicon plasma sources for large-area processes. Experiments were performed with the one and two coils to measure plasma and electrical parameters, and a circuit simulation was performed to measure the current at each coil in the 2-coil experiment. Based on the result, we could determine the possibility of multiple ICP sources due to a direct change of impedance due to current and saturation of impedance due to the skin-depth effect. However, a helicon plasma source is difficult to adapt to the multiple sources due to the consistent change of real impedance due to mode transition and the low uniformity of the B-field confinement. As a result, it is expected that ICP can be adapted to multiple sources for large-area processes.},
doi = {10.1063/1.4892170},
journal = {Physics of Plasmas},
number = 8,
volume = 21,
place = {United States},
year = {Fri Aug 15 00:00:00 EDT 2014},
month = {Fri Aug 15 00:00:00 EDT 2014}
}