Origin of the current discretization in deep reset states of an Al{sub 2}O{sub 3}/Cu-based conductive-bridging memory, and impact on state level and variability
- IMEC, Kapeldreef 75, 3001 Leuven (Belgium)
- KU Leuven, Department of Physics and Astronomy, Celestijnenlaan 200D, 3001 Leuven (Belgium)
In this paper, we develop a Quantum-Point-Contact (QPC) model describing the state conduction in a W/Al{sub 2}O{sub 3}/TiW/Cu Conductive-Bridging Memory cell (CBRAM). The model allows describing both the voltage- and the temperature-dependence of the conduction. For deep current levels, a resistance component is added in series to the point-contact constriction to account for electron scattering in the residual filament. The fitting of single-particle perturbation also allowed to estimate the number and effective size of the conduction-controlling particles in the QPC constriction. The results clearly point to smaller particles for CBRAM (Cu particles) as compared to oxide-based resistive RAM involving oxygen-vacancy defects, which is discussed as a possible origin of deeper reset level obtained in CBRAM. We also evidence a beneficial impact of this smaller particle size on lower Random-Telegraph-Noise amplitude measured on CBRAM devices.
- OSTI ID:
- 22299996
- Journal Information:
- Applied Physics Letters, Vol. 104, Issue 23; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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