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Title: Response to “Comment on ‘A study of vertical and in-plane electron mobility due to interface roughness scattering at low temperature in InAs-GaSb type-II superlattices’” [J. Appl. Phys. 115, 146101 (2014)]

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4871007· OSTI ID:22273613
 [1];  [2]
  1. Research Institute for Applied Physics and Astronomy, University of Tabriz, Tabriz, 51666-14766 (Iran, Islamic Republic of)
  2. School of Electrical, Electronic and Computer Engineering, University of Western Australia, Crawley WA 6009 (Australia)

No abstract prepared.

OSTI ID:
22273613
Journal Information:
Journal of Applied Physics, Vol. 115, Issue 14; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English