Evolution of nano-structures of silver due to rapid thermal annealing
Abstract
This report deals with rapid thermal annealing (RTA) effect on continuous silver film on Si(100) substrate. For this purpose silver films of different thicknesses were deposited and subsequently annealed at 500 and 800 °C. The as-deposited and annealed samples were investigated by scanning electron microscope (SEM). Formations of different nano-structures have been observed. Fragmentation of formed nanoislands also observed at temperature below melting temperature.
- Authors:
- Publication Date:
- OSTI Identifier:
- 22269211
- Resource Type:
- Journal Article
- Journal Name:
- AIP Conference Proceedings
- Additional Journal Information:
- Journal Volume: 1591; Journal Issue: 1; Conference: 58. DAE solid state physics symposium 2013, Patiala, Punjab (India), 17-21 Dec 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 77 NANOSCIENCE AND NANOTECHNOLOGY; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ANNEALING; DEPOSITS; FILMS; MELTING POINTS; NANOSTRUCTURES; SCANNING ELECTRON MICROSCOPY; SILVER; SUBSTRATES; THICKNESS
Citation Formats
Mondal, Shyamal, and Bhattacharyya, S. R., E-mail: shyamal.mondal@saha.ac.in. Evolution of nano-structures of silver due to rapid thermal annealing. United States: N. p., 2014.
Web. doi:10.1063/1.4872832.
Mondal, Shyamal, & Bhattacharyya, S. R., E-mail: shyamal.mondal@saha.ac.in. Evolution of nano-structures of silver due to rapid thermal annealing. United States. https://doi.org/10.1063/1.4872832
Mondal, Shyamal, and Bhattacharyya, S. R., E-mail: shyamal.mondal@saha.ac.in. 2014.
"Evolution of nano-structures of silver due to rapid thermal annealing". United States. https://doi.org/10.1063/1.4872832.
@article{osti_22269211,
title = {Evolution of nano-structures of silver due to rapid thermal annealing},
author = {Mondal, Shyamal and Bhattacharyya, S. R., E-mail: shyamal.mondal@saha.ac.in},
abstractNote = {This report deals with rapid thermal annealing (RTA) effect on continuous silver film on Si(100) substrate. For this purpose silver films of different thicknesses were deposited and subsequently annealed at 500 and 800 °C. The as-deposited and annealed samples were investigated by scanning electron microscope (SEM). Formations of different nano-structures have been observed. Fragmentation of formed nanoislands also observed at temperature below melting temperature.},
doi = {10.1063/1.4872832},
url = {https://www.osti.gov/biblio/22269211},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1591,
place = {United States},
year = {Thu Apr 24 00:00:00 EDT 2014},
month = {Thu Apr 24 00:00:00 EDT 2014}
}
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