Effect of reduction of trap charge carrier density in organic field effect transistors by surface treatment of dielectric layer
- Physics of Energy Harvesting Division, CSIR-National Physical Laboratory, CSIR-Network of Institute for Solar Energy (NISE), Dr. K.S.Krishnan Road, New Delhi 110012 (India)
In this work, we have studied the effect of surface treatment of SiO{sub 2} dielectric layer on the reduction of the trap charge carrier density at dielectric/semiconducting interface by fabricating a metal–insulator–semiconductor (MIS) device using α, ω-dihexylcarbonylquaterthiophene as semiconducting layer. SiO{sub 2} dielectric layer has been treated with 1,1,1,3,3,3-hexamethyldisilazane (HMDS) to modify the chemical group acting as charge traps. Capacitance-voltage measurements have been performed on MIS devices fabricated on SiO{sub 2} and HMDS treated SiO{sub 2}. These data have been used for the calculation of trap charge carrier density and Debye length at the dielectric-semiconductor interface. The calculated trap charge carrier density has been found to reduce from (2.925 ± 0.049) × 10{sup 16} cm{sup −3} to (2.025 ± 0.061) × 10{sup 16} cm{sup −3} for the MIS device with HMDS treated SiO{sub 2} dielectric in comparison to that of untreated SiO{sub 2}. Next, the effect of reduction in trap charge carrier density has been studied on the performance of organic field effect transistors. The improvement in the device parameters like mobility, on/off ratio, and gate leakage current has been obtained with the effect of the surface treatment. The charge carrier mobility has been improved by a factor of 2 through this treatment. Further, the influence of the treatment was observed by atomic force microscope and Fourier transform infrared spectroscopy techniques.
- OSTI ID:
- 22266168
- Journal Information:
- Journal of Applied Physics, Vol. 114, Issue 22; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ATOMIC FORCE MICROSCOPY
CAPACITANCE
CHARGE CARRIERS
COMPARATIVE EVALUATIONS
DEBYE LENGTH
DIELECTRIC MATERIALS
FIELD EFFECT TRANSISTORS
FOURIER TRANSFORM SPECTROMETERS
INTERFACES
LEAKAGE CURRENT
REDUCTION
SEMICONDUCTOR MATERIALS
SILICA
SILICON OXIDES
SURFACE TREATMENTS
TRAPS