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Title: Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO{sub 2} using tetrakis(dimethylamido)titanium and water

Abstract

Atomic layer deposition of titanium dioxide using tetrakis(dimethylamido)titanium (TDMAT) and water vapor is studied by reflection-absorption infrared spectroscopy (RAIRS) with a time resolution of 120 ms. At 190 °C and 240 °C, a decrease in the absorption from adsorbed TDMAT is observed without any evidence of an adsorbed product. Ex situ measurements indicate that this behavior is not associated with an increase in the impurity concentration or a dramatic change in the growth rate. A desorbing decomposition product is consistent with these observations. RAIRS also indicates that dehydroxylation of the growth surface occurs only among one type of surface hydroxyl groups. Molecular water is observed to remain on the surface and participates in reactions even at a relatively high temperature (110 °C) and with long purge times (30 s)

Authors:
; ;  [1];  [2];  [3]
  1. Chemical Sciences Division, National Institute of Standards and Technology, 100 Bureau Dr., Stop 8320, Gaithersburg, Maryland 20899-8320 (United States)
  2. Biomolecular Measurement Division, National Institute of Standards and Technology, 100 Bureau Dr., Stop 8362, Gaithersburg, Maryland 20899-8362 (United States)
  3. Semiconductor and Dimensional Metrology Division, National Institute of Standards and Technology, 100 Bureau Dr., Stop 8120, Gaithersburg, Maryland 20899-8120 (United States)
Publication Date:
OSTI Identifier:
22258556
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 32; Journal Issue: 3; Other Information: (c) 2014 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0734-2101
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ABSORPTION; ABSORPTION SPECTROSCOPY; DECOMPOSITION; HYDROXIDES; IMPURITIES; INFRARED SPECTRA; LAYERS; SURFACES; TEMPERATURE RANGE 0400-1000 K; TIME RESOLUTION; TITANIUM; TITANIUM OXIDES; WATER; WATER VAPOR

Citation Formats

Sperling, Brent A., E-mail: brent.sperling@nist.gov, Hoang, John, Kimes, William A., Maslar, James E., Steffens, Kristen L., and Nguyen, Nhan V. Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO{sub 2} using tetrakis(dimethylamido)titanium and water. United States: N. p., 2014. Web. doi:10.1116/1.4872166.
Sperling, Brent A., E-mail: brent.sperling@nist.gov, Hoang, John, Kimes, William A., Maslar, James E., Steffens, Kristen L., & Nguyen, Nhan V. Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO{sub 2} using tetrakis(dimethylamido)titanium and water. United States. https://doi.org/10.1116/1.4872166
Sperling, Brent A., E-mail: brent.sperling@nist.gov, Hoang, John, Kimes, William A., Maslar, James E., Steffens, Kristen L., and Nguyen, Nhan V. Thu . "Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO{sub 2} using tetrakis(dimethylamido)titanium and water". United States. https://doi.org/10.1116/1.4872166.
@article{osti_22258556,
title = {Time-resolved surface infrared spectroscopy during atomic layer deposition of TiO{sub 2} using tetrakis(dimethylamido)titanium and water},
author = {Sperling, Brent A., E-mail: brent.sperling@nist.gov and Hoang, John and Kimes, William A. and Maslar, James E. and Steffens, Kristen L. and Nguyen, Nhan V.},
abstractNote = {Atomic layer deposition of titanium dioxide using tetrakis(dimethylamido)titanium (TDMAT) and water vapor is studied by reflection-absorption infrared spectroscopy (RAIRS) with a time resolution of 120 ms. At 190 °C and 240 °C, a decrease in the absorption from adsorbed TDMAT is observed without any evidence of an adsorbed product. Ex situ measurements indicate that this behavior is not associated with an increase in the impurity concentration or a dramatic change in the growth rate. A desorbing decomposition product is consistent with these observations. RAIRS also indicates that dehydroxylation of the growth surface occurs only among one type of surface hydroxyl groups. Molecular water is observed to remain on the surface and participates in reactions even at a relatively high temperature (110 °C) and with long purge times (30 s)},
doi = {10.1116/1.4872166},
url = {https://www.osti.gov/biblio/22258556}, journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 3,
volume = 32,
place = {United States},
year = {2014},
month = {5}
}