A variable-temperature nanostencil compatible with a low-temperature scanning tunneling microscope/atomic force microscope

Journal Article · Sat Feb 15 00:00:00 EST 2014 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.4864296· OSTI ID:22254166

Steurer, Wolfram; Gross, Leo; Schlittler, Reto R.; Meyer, Gerhard ^[1]

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1. IBM Research-Zurich, 8803 Rüschlikon (Switzerland)

We describe a nanostencil lithography tool capable of operating at variable temperatures down to 30 K. The setup is compatible with a combined low-temperature scanning tunneling microscope/atomic force microscope located within the same ultra-high-vacuum apparatus. The lateral movement capability of the mask allows the patterning of complex structures. To demonstrate operational functionality of the tool and estimate temperature drift and blurring, we fabricated LiF and NaCl nanostructures on Cu(111) at 77 K.

• OSTI ID: 22254166
• Journal Information: Review of Scientific Instruments, Vol. 85, Issue 2; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
ATOMIC FORCE MICROSCOPY
LITHIUM FLUORIDES
NANOSTRUCTURES
PRESSURE RANGE MICRO PA
RESPIRATORS
SCANNING TUNNELING MICROSCOPY
SODIUM CHLORIDES
TEMPERATURE RANGE 0065-0273 K