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Title: Thin film deposition of diamond using normal paraffins as source of diamond nucleation centers

Abstract

Highlights: ► Paraffin compounds are diamond nucleation sources. ► Thermoconductivity of Cu–DTF device is higher than such conductivity of Cu. ► DTF growth in HFCVD reactor is not linear function of time. -- Abstract: We propose a process for diamond thin film (DTF) deposition using normal paraffins (nP) as source of diamond nucleation centers. We deposited micro-crystalline diamond thin films (MCDTF) on a Cu substrate using Hot Filament CVD (HFCVD) and Passive Pt/Pd Surface Catalysis (PPt/PdSC) methods. Beeswax and a 1:1 mixture of normal paraffins of the general formula CH{sub 3}(CH{sub 2}){sub n}CH{sub 3} with n = 22 and 26 were tested as nP starting material. The films obtained were characterized by scanning electronic microscopy (SEM), Raman scattering temperature dependent spectroscopy and X-ray diffraction (XRD) methods, all of which confirmed that the deposited material is MCDTF.

Authors:
 [1];  [1]
  1. Nano-Technology Laboratory, Triangle Inc., 01079 (Ukraine)
Publication Date:
OSTI Identifier:
22215610
Resource Type:
Journal Article
Journal Name:
Materials Research Bulletin
Additional Journal Information:
Journal Volume: 47; Journal Issue: 11; Other Information: Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0025-5408
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY; CHEMICAL VAPOR DEPOSITION; DEPOSITS; DIAMONDS; ENERGY-LOSS SPECTROSCOPY; MIXTURES; NANOSTRUCTURES; PARAFFIN; POLYMERS; RAMAN EFFECT; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TEMPERATURE DEPENDENCE; THIN FILMS; TIME DEPENDENCE; X-RAY DIFFRACTION

Citation Formats

Ershova, A., E-mail: ershovaangelina@mail.ru, and Eizenbraun, A. Thin film deposition of diamond using normal paraffins as source of diamond nucleation centers. United States: N. p., 2012. Web. doi:10.1016/J.MATERRESBULL.2012.06.040.
Ershova, A., E-mail: ershovaangelina@mail.ru, & Eizenbraun, A. Thin film deposition of diamond using normal paraffins as source of diamond nucleation centers. United States. doi:10.1016/J.MATERRESBULL.2012.06.040.
Ershova, A., E-mail: ershovaangelina@mail.ru, and Eizenbraun, A. Thu . "Thin film deposition of diamond using normal paraffins as source of diamond nucleation centers". United States. doi:10.1016/J.MATERRESBULL.2012.06.040.
@article{osti_22215610,
title = {Thin film deposition of diamond using normal paraffins as source of diamond nucleation centers},
author = {Ershova, A., E-mail: ershovaangelina@mail.ru and Eizenbraun, A.},
abstractNote = {Highlights: ► Paraffin compounds are diamond nucleation sources. ► Thermoconductivity of Cu–DTF device is higher than such conductivity of Cu. ► DTF growth in HFCVD reactor is not linear function of time. -- Abstract: We propose a process for diamond thin film (DTF) deposition using normal paraffins (nP) as source of diamond nucleation centers. We deposited micro-crystalline diamond thin films (MCDTF) on a Cu substrate using Hot Filament CVD (HFCVD) and Passive Pt/Pd Surface Catalysis (PPt/PdSC) methods. Beeswax and a 1:1 mixture of normal paraffins of the general formula CH{sub 3}(CH{sub 2}){sub n}CH{sub 3} with n = 22 and 26 were tested as nP starting material. The films obtained were characterized by scanning electronic microscopy (SEM), Raman scattering temperature dependent spectroscopy and X-ray diffraction (XRD) methods, all of which confirmed that the deposited material is MCDTF.},
doi = {10.1016/J.MATERRESBULL.2012.06.040},
journal = {Materials Research Bulletin},
issn = {0025-5408},
number = 11,
volume = 47,
place = {United States},
year = {2012},
month = {11}
}