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Title: Eigenmode characteristics of the double tearing mode in the presence of shear flows

Journal Article · · Physics of Plasmas
DOI:https://doi.org/10.1063/1.4793445· OSTI ID:22113429
 [1]; ;  [2];  [1]
  1. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)
  2. Graduate School of Energy Science, Kyoto University, Uji, Kyoto 6110011 (Japan)

The double tearing mode (DTM) is characterized by two eigen states with antisymmetric or symmetric magnetic island structure, referred to as the even or odd DTM. In this work, we systematically revisit the DTM instabilities in the presence of an antisymmetric shear flow with a focus on eigenmode characteristics as well as the stabilization or destabilization mechanism in a wide parameter region. Both initial value simulation and eigenvalue analysis are performed based on reduced resistive MHD model in slab geometry. A degenerated eigen state is found at a critical flow amplitude v{sub c}. The even (or odd) DTM is stabilized (or destabilized) by weak shear flow below v{sub c} through the distortion of magnetic islands mainly due to the global effect of shear flow rather than the local flow shear. The distortion can be quantified by the phase angles of the perturbed flux, showing a perfect correspondence to the growth rates. As the shear flow increases above v{sub c}, the degenerated eigen state bifurcates into two eigen modes with the same growth rate but opposite propagating direction, resulting in an oscillatory growth of fluctuation energy. It is identified that two eigen modes show the single tearing mode structure due to the Alfven resonance (AR) occurring on one current sheet. Most importantly, the AR can destabilize the DTMs through enhancing the plasma flow exerting on the remaining island. Meanwhile, the local flow shear plays a remarkable stabilizing role in this region. In addition, the eigenmode characteristic of the electromagnetic Kelvin-Helmholtz instability is also discussed.

OSTI ID:
22113429
Journal Information:
Physics of Plasmas, Vol. 20, Issue 2; Other Information: (c) 2013 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
Country of Publication:
United States
Language:
English