Thermally deposited Ag-doped CdS thin film transistors with high-k rare-earth oxide Nd{sub 2}O{sub 3} as gate dielectric
- Sibsagar College, Material Science Laboratory, Department of Physics (India)
The performance of thermally deposited CdS thin film transistors doped with Ag has been reported. Ag-doped CdS thin films have been prepared using chemical method. High dielectric constant rare earth oxide Nd{sub 2}O{sub 3} has been used as gate insulator. The thin film trasistors are fabricated in coplanar electrode structure on ultrasonically cleaned glass substrates with a channel length of 50 {mu}m. The thin film transistors exhibit a high mobility of 4.3 cm{sup 2} V{sup -1} s{sup -1} and low threshold voltage of 1 V. The ON-OFF ratio of the thin film transistors is found as 10{sup 5}. The TFTs also exhibit good transconductance and gain band-width product of 1.15 Multiplication-Sign 10{sup -3} mho and 71 kHz respectively.
- OSTI ID:
- 22105548
- Journal Information:
- Semiconductors, Vol. 47, Issue 3; Other Information: Copyright (c) 2013 Pleiades Publishing, Ltd.; Country of input: International Atomic Energy Agency (IAEA); ISSN 1063-7826
- Country of Publication:
- United States
- Language:
- English
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