Non-invasive in situ plasma monitoring of reactive gases using the floating harmonic method for inductively coupled plasma etching application
Journal Article
·
· Review of Scientific Instruments
- Department of Materials Science and Engineering, University of Texas at Dallas, Texas 75080 (United States)
- Department of Electrical Engineering, University of Texas at Dallas, Texas 75080 (United States)
The floating harmonic method was developed for in situ plasma diagnostics of allowing real time measurement of electron temperature (T{sub e}) and ion flux (J{sub ion}) without contamination of the probe from surface modification by reactive species. In this study, this novel non-invasive diagnostic system was studied to characterize inductively coupled plasma of reactive gases monitoring T{sub e} and J{sub ion} for investigating the optimum plasma etching conditions and controlling of the real-time plasma surface reaction in the range of 200-900 W source power, 10-100 W bias power, and 3-15 mTorr chamber pressure, respectively.
- OSTI ID:
- 22105503
- Journal Information:
- Review of Scientific Instruments, Vol. 84, Issue 4; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
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