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Title: Critical field of two-dimensional superconducting Sn{sub 1-x}/Si{sub x} bimetallic composite cluster assembled films with energetic cluster impact deposition

Abstract

Sn{sub 1-x}/Si{sub x} cluster assembled films have been prepared by an energetic cluster impact deposition using a plasma-gas-condensation cluster beam deposition apparatus. Transmission electron microscope images indicated that individual clusters have composite morphologies, where Sn and Si were separated from each other. The superconducting critical magnetic fields, H{sub c}, of Sn{sub 1-x}/Si{sub x} cluster assembled films were measured and found to be much higher than the critical magnetic field of the bulk Sn. We estimated the H{sub c} values by using a theory of the superconducting thin film. The estimated values are in good agreement with the experiments, indicating that the Sn{sub 1-x}/Si{sub x} cluster assembled films can be regarded as a two-dimensional system although thickness, t, of Sn{sub 1-x}/Si{sub x} cluster assembled films (t Almost-Equal-To 1000 nm) is thicker than conventional superconducting thin film (t < 100 nm).

Authors:
;  [1];  [2]
  1. Department of Frontier Materials, Graduate School of Engineering, Nagoya Institute of Technology, Nagoya 466-8555 (Japan)
  2. Applied Physics, Graduate School of Engineering, Nagoya Institute of Technology, Nagoya 466-8555 (Japan)
Publication Date:
OSTI Identifier:
22102377
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 113; Journal Issue: 17; Other Information: (c) 2013 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; CLUSTER BEAMS; COMPOSITE MATERIALS; CRITICAL FIELD; DEPOSITION; NANOSTRUCTURES; PLASMA; SILICON; SUPERCONDUCTIVITY; SURFACES; THICKNESS; THIN FILMS; TIN; TRANSMISSION ELECTRON MICROSCOPY; TWO-DIMENSIONAL CALCULATIONS

Citation Formats

Kurokawa, Yuichiro, Hihara, Takehiko, and Ichinose, Ikuo. Critical field of two-dimensional superconducting Sn{sub 1-x}/Si{sub x} bimetallic composite cluster assembled films with energetic cluster impact deposition. United States: N. p., 2013. Web. doi:10.1063/1.4798262.
Kurokawa, Yuichiro, Hihara, Takehiko, & Ichinose, Ikuo. Critical field of two-dimensional superconducting Sn{sub 1-x}/Si{sub x} bimetallic composite cluster assembled films with energetic cluster impact deposition. United States. https://doi.org/10.1063/1.4798262
Kurokawa, Yuichiro, Hihara, Takehiko, and Ichinose, Ikuo. Tue . "Critical field of two-dimensional superconducting Sn{sub 1-x}/Si{sub x} bimetallic composite cluster assembled films with energetic cluster impact deposition". United States. https://doi.org/10.1063/1.4798262.
@article{osti_22102377,
title = {Critical field of two-dimensional superconducting Sn{sub 1-x}/Si{sub x} bimetallic composite cluster assembled films with energetic cluster impact deposition},
author = {Kurokawa, Yuichiro and Hihara, Takehiko and Ichinose, Ikuo},
abstractNote = {Sn{sub 1-x}/Si{sub x} cluster assembled films have been prepared by an energetic cluster impact deposition using a plasma-gas-condensation cluster beam deposition apparatus. Transmission electron microscope images indicated that individual clusters have composite morphologies, where Sn and Si were separated from each other. The superconducting critical magnetic fields, H{sub c}, of Sn{sub 1-x}/Si{sub x} cluster assembled films were measured and found to be much higher than the critical magnetic field of the bulk Sn. We estimated the H{sub c} values by using a theory of the superconducting thin film. The estimated values are in good agreement with the experiments, indicating that the Sn{sub 1-x}/Si{sub x} cluster assembled films can be regarded as a two-dimensional system although thickness, t, of Sn{sub 1-x}/Si{sub x} cluster assembled films (t Almost-Equal-To 1000 nm) is thicker than conventional superconducting thin film (t < 100 nm).},
doi = {10.1063/1.4798262},
url = {https://www.osti.gov/biblio/22102377}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 17,
volume = 113,
place = {United States},
year = {2013},
month = {5}
}